国家/地区 中国（5）
IPC部 C（7） H（5） G（2）
IPC大类 C23（7） H01（5） C01（2）
C30（2） G01（2）
IPC小类 C23C（7） H01L（4） C01B（2）
C30B（2）
IPC C23C016/34（7）
发明人 LU J（2）
公开年 2022（7）
申请年 2022（7）
专利权人

Preparing single crystal substrate comprises forming gallium nitride porous layer on surface of sapphire substrate, depositing barrier layer e.g. silica to cover top surface of the porous layer, removing barrier layer, performing epitaxial growth of single crystal layer and separating.

LU J

Wafer used to chemical vapor deposition growth of uniform graphene comprises planar silicon substrate, insulating layer provided across silicon substrate, and barrier layer provided across the insulating layer.

DIXON S, KAINTH J, JAGT R, GUINEY I, BADCOCK T J

Graphene sensor composite heat protection structure, comprises substrate layer, graphene sensitive layer, nitride isolation layer, alumina protective layer, and high temperature ceramic protective coating, where substrate layer is provided with a graphene sensitive layer.

LI M, ZHANG H, WANG J

Making solar cell involves depositing multiple nanoparticles on surface of chemical vapor deposition substrate, heating substrate and nanoparticles at sub-atmospheric pressure, and contacting gaseous mixture comprising methane and hydrogen with nanoparticles.

ELSAYED K A M, MAAROUF A A

Manufacturing graphene of pressure sensor, comprises e.g. manufacturing sensor structure, manufacturing mask plate of each layer of sensor structure and depositing insulating layer on silicon substrate surface.

WU X, RUI L, ZHANG Q, LU J, LI Y

Producing insulating high thermal conductivity graphene film comprises placing activated base film in vapour deposition chamber, taking diborane and disilane as precursor material and ammonia and nitrogen as carrier and introducing argon gas for deposition, carbonizing and graphitizing, and rolling.

ZHOU Z, ZHU Q, ZHENG Z

Preparing gallium nitride film used for blue light emitting diode, comprises e. g. drying pre-processed substrate with high-purity nitrogen, adding into vacuum reaction chamber, heating, stabilizing first preset time, and using remote ammonia plasma to process second preset time.

YAN T, YE Z, REN W, WANG R, ZHANG Y