国家/地区 世界知识产权组织（109）
IPC部 C（109）
IPC大类 C01（109）
IPC小类 C01B（100） H01M（62） H01G（21）
H01L（21） B82Y（17） C23C（16）
C01G（14） H01B（11） C09D（6）
B01J（5） C01F（5） C08K（5）
C08L（5） H05H（5） H05K（5）
IPC H01M004/62（40） H01M004/36（30） H01M010/052（27）
C01B032/182（22） C01B032/194（22） H01M004/38（20）
H01M004/587（17） C01B032/05（15） B82Y040/00（13）
C01B032/198（13） H01G011/36（13） C01B032/184（12）
C01B032/186（12） H01M010/0525（12） C23C016/26（11）
发明人 LIM J（6） YAMAZAKI S（5） HYUN L J（4）
IMSUNGWOO（4） JEON Y M（4） LEE H S（4）
LEE J（4） LI Y（4） LIM J C（4）
LIM S W（4） MATSUMOTO T（4） NAVEH D（4）
PARK J G（4） WADA M（4） ATIAS B（3）
公开年 2022（109）
申请年 2021（67）  2022（36）  2020（6） 
专利权人 SEMICONDUCTO.（5） TOKYO ELECTR.（5） DAEJOO ELECT.（4） LG ENERGY SO.（4）
UNIV BARILAN（4） MELLANOX TEC.（3） SAMSUNG SDI .（3） APPLIED MATE.（2）
GUANGDONG BR.（2） HUNAN BRUNP .（2） HUNAN BRUNP .（2） HUNAN BRUNP .（2）
NINGDE AMPER.（2） PARAGRAF LTD（2） PCB TECHNOLO.（2） SNU R DB FO.（2）
UNIV CALIFOR.（2） UNIV SEOUL N.（2）

Architected transitional metal dichalcogenides (TMD) foam used in battery for producing electrical energy, comprises layers of TMD arranged on top of each other along given direction Z, channels extending along given direction M, and pores.

TUNG V C, WEI X, FU J, XU W, DING L

Active material used for negative electrode, comprises core, and shell comprising metal particles which are one or more of magnesium, aluminum, silicon, calcium, iron, manganese, cobalt, nickel, zinc, and germanium, coated with alkali-metal-containing material on all or portion of particle surface.

KWON S, HONG S, KANG S, SHIM H, PARK B, HONG S H, SUNGHWAN K, SHIM H W, PARK B H

Silicon-oxygen material used for preparing material for forming negative electrode used for lithium ion battery, comprises silicon oxide, and is in the form of primary particles having preset Wadell sphericity.

CHEN X, PANG C, DENG Z, LIANG T, REN J, HE X, DENG C, REN J G, HUH S

Preparing safe liquefied gas electrolyte that will gas off at specific pressure and temperature by mixing first electrolyte e.g. fluoromethane with second electrolyte e.g. propane and mixing third electrolyte component to first mixture.

RUSTOMJI C S, LEE J, ROYER J, CEJA M

Digital formation of two-dimensional materials structures used for electronic components, involves generating donor substrates containing back surface and front surface, applying coating to front surface, and irradiating coating containing donor material.

ZERGIOTI I, PAPAZOGLOU S, ZACHARATOS F, LOGOTHETI A, PESQUERA A, ZURUTUZA A, NAVEH D

Preparing carbon-silicon composite material comprises heating and rotating tubular chamber with carbon-based material, introducing reactive silicon-containing gas mixture, applying thermal treatment, and recovering obtained product.

BURCHAK O, LASSEGUE P

Forming lamination stack by providing core, applying adhesive layer to top surface of core, and attaching graphene-metal structure to top surface of core via adhesive layer, where graphene-metal structure comprises metal layer and graphene layer on top surface of metal layer or bottom surface.

NAVEH D, LEVI A, BENNAIM Y, ELIYA Y, DANINO S, LIPP E, MENTOVICH E, ROTEM Y, ATIAS B

Repairing layers of laminate stack or printed circuit board, comprises providing layered structure, identifying fault location in outer graphene layer, preparing surface of outer graphene layer, and applying localized heat on fault location.

MENTOVICH E, ATIAS B, NAVEH D, LEVI A, SMOLINSKY E Z B

Substrate processing includes taking substrate into processing vessel, removing oxygen-containing layer on substrate using plasma of gas mixture including hydrogen-containing gas, and forming nucleation layer and graphene film on substrate using plasma of gas mixture including carbon-containing gas.

IFUKU R, MATSUMOTO T, WADA M, KABUKI N

Creating conductive-lubricant-coated printed circuit board (PCB) by providing lamination stack, and applying heat and pressure to lamination stack to form PCB, where process to create lamination stack comprises attaching conductive-lubricant-metal structure to core through adhesive layer.

NAVEH D, LEVI A, BENNAIM Y, ELIYA Y, DANINO S, LIPP E, MENTOVICH E, ROTEM Y, ATIAS B, RUBINSTEIN A, RUBINSTEN A