国家/地区 中国（3） 美国（2） 世界知识产权组织（2）
IPC部 C（9）
IPC大类 C01（9）
IPC小类 C01B（9）
IPC C01B032/186（9）
发明人
公开年 2020（2） 2022（2） 2023（2）
申请年 2021（3）  2016（2）  2020（2）  2022（2） 
专利权人

Method for fabricating two-dimensional channel transistor involves growing hexagonal-boron nitride layer on substrate, selectively etching hexagonal-boron nitride layer by exposing hexagonal-boron nitride layer to sulfur hexafluoride plasma gas, and treating etched layer in potassium hydroxide.

SHRIVASTAVA M, RAWAT J S, MEERSHA A

Terahertz wave active modulator for use in flexible wearable device, has hexagonal boron nitride whose two sides are respectively provided with first graphene and second graphene, where graphene strip is provided with ion liquid grid.

XIE Y, LI S

Visualizing distribution and intrinsic orientation of periodically spaced one-dimensional structures by depositing electrically conductive solid film of imaging material onto surface of two-dimensional material, providing polarization microscope, and imaging layered composite at acquisition angles.

AMADO E, KRESSLER J

Forming graphene layer structure, comprises providing growth substrate having growth surface, and forming graphene layer on growth surface by chemical vapor deposition, where growth surface is formed of material e.g. yttrium-stabilized zirconia.

DIXON S, GUINEY I, THOMAS S, GRIFFIN R M, BADCOCK T J

Hyperbolic super-surface for hypersurface imaging and light energy transmission device to form hyperlens based on graphene-boron nitride lateral heterojunction, has heterostructure layer that comprises periodic nano-grating structure formed by strip-shaped graphene and boron nitride layers.

WANG X, CHEN K

Graphene-surface waveguide optical fiber useful in all-optical modulation probe and all-optical modulator, comprises first single-mode optical fiber, second single-mode optical fiber and coreless optical fiber.

LIAO C, WANG Y, HAN J, ZHANG Y, WANG J, LIU D

Manufacturing graphene electrode, comprises e.g. forming carbon source on substrate, forming photoresist layer on carbon source, exposing photoresist layer with mask, developing photoresist layer after exposure and forming metal layer.

WANG H

Light-absorption material consists of single and multiwalled carbon nanotubes, and graphene on walls.

KARAEVA A R K, KAZENNOV N V, MORDKOVICH V Z, ZHUKOVA E A

Manufacturing method for nano structure antireflection film, involves forming antireflection film using graphene as growth substrate, after forming hexagonal graphene honeycomb lattice on silicon dioxide layer.

ZHA G