国家/地区 中国（5） 欧洲专利局（EPO）（5） 日本（3） 美国（3） 加拿大（2） 韩国（2） 世界知识产权组织（2）
IPC部 C（7）
IPC大类 C01（7） C08（7） C09（3）
B29（2） B33（2） H01（2）
H05（2）
IPC小类 C01B（7）
IPC C08L077/06（7）
发明人 BOBENRIETH A（2）
公开年 2015（3）
申请年 2014（3）  2022（2） 
专利权人 SOLVAY SA（2）

Preparing basic copper phosphate for use in laser etching material for in laser etching or laser activation, involves mixing basic copper carbonate and phosphoric acid, heating to boiling point, and then separating liquid phase.

LI X, SHEN X, WEN B, TANG H

Composition used for three-dimensional printing e.g. additive manufacturing, comprises particles comprising thermoplastic polymer grafted to carbon nanomaterial, and particles have preset aerated density.

FARRUGIA V M, SRISKANDHA S E, CLARIDGE R, SRISKANDAR S E, EMPARUZIA V, SIBANTIISWARISLISKANDA

Polymerization of high thermal conductivity graphene/nylon material for spinning stage, by mixing oxidized graphene dispersion liquid and nylon monomer, introducing nitrogen gas, stirring, heating, cooling and polymerizing mixture.

LUO T, PAN K, QIU Y

Manufacture of graphene oxide-polymer nanocomposite for preparing fuel barrier material, involves thermally-reducing graphene oxide, and polymerizing monomer when obtained thermally-reduced graphene oxide having preset amount of oxygen.

BOBENRIETH A

Manufacturing a nanocomposite comprises having in a reactor the graphene material and a monomer material for the preparation of the semi-aromatic polyamide, and polymerizing the monomer material in the reactor.

BOBENRIETH A

Graphite-type carbon raw material used as graphene precursor, has rhombohedral system graphite layer and hexagonal system graphite layer in ratio more than preset value, as measured using peak intensities specific planes of layers.

HASEGAWA S, KAMIYA N, SHOJI H, NAGISA K, HASEGAWA SHOJI, KAMIYA NAGISA, SHEN Y

Functionalized graphene sheets useful in polymer composite and resin have specific carbon to oxygen molar ratio.

AKSAY I A, KORKUT S, MILIUS D L, PRUDHOMME R K, PRUD HOMME R K, AKSAY I, MILIUS D, PRUDHOMME R, PRUD H R K, PRUD APOS HOMME R K