国家/地区 中国（4） 韩国（4） 美国（3） 台湾（2）
IPC部 C（7）
IPC大类 C01（7）
IPC小类 C01B（7）
IPC C01B031/04（6） G03F007/20（4） H01L021/027（3）
C01B032/194（2） G03F001/62（2） G03F007/00（2）
发明人
公开年 2017（3） 2016（2） 2018（2）
申请年 2016（7）
专利权人

Micro-patterning of reduced graphene oxide in manufacture of electrode, involves patterning predetermined electrode structure by forming negative mold on substrate, coating reduced graphene oxide suspension on substrate, and removing mold.

JAE Y P, HYO S Y, XING X

Method of making a pellicle for use in extreme ultraviolet (EUV) lithography system, by depositing graphene layer over first material layer, and depositing amorphous silicon layer over graphene layer.

TU C, CHEN C, YOO C S, CHANG J, TSAI C, LIU P, LEE H, LIN C, LIN Y, TU Z, CHEN J, CAI J, YOU Q, ZHANG Z, LIN Z, LIU B, LI X, YOO C

Producing nanocomposite, comprises preparing mixed solution including titanium dioxide and graphene oxide, and reacting the mixed solution with solvent by thermolysis method to prepare nanocomposite.

KIM J S, M YADAV H

Method for manufacturing pellicle for lithographic apparatus involves removing first substrate portion to form freestanding membrane from graphene layer, in which freestanding membrane is supported by second substrate portion.

PETER M, ABEGG E A, GIESBERS A J, KLOOTWIJK J H, NASALEVICH M A, VAN DEN EINDEN W T, VAN DER ZANDE W J, VAN ZWOL P, VERMEULEN J P M, VLES D F, VOORTHUIJZEN W, GIESBERS A J M, VAN ZWOL P J, VOORTHUIJZEN W P, VAN DEN EINDEN W T A J, VERMEULEN J P M B

Extreme UV light generation apparatus for generating extreme UV light to realize testing system, has optical unit fixed in chamber, and protection film provided adjacent to optical unit, where protection film includes graphite or graphene.

KIM E, KIM M J, PARK J, LEE D, KIM B

Removal of graphene used for patterning monolayer or multilayer graphene film, by irradiation with UV light of specific wavelength in specific environment.

LIU H, WANG W, TAN H, QIN X

Preparing nanoscale graphene structure involves selecting substrate and growing graphene on substrate, depositing chromium film on graphene, etching graphene using ion beam etching technology, removing metallic film to obtain pure nanoscale.

GU C, LI J, QUAN B, YANG H, TANG C, ZHANG H