国家/地区 中国（12） 韩国（2） 美国（2） 世界知识产权组织（2）
IPC部 C（13）
IPC大类 C08（13）
IPC小类 C08G（13）
IPC C08K003/36（13）
发明人 WEN Y（6） WANG X（4） WANG L（3）
CHENG X（2） XU L（2） YU R（2）
ZHANG D（2）
公开年 2018（6） 2021（3） 2023（2）
申请年 2016（5）  2021（3）  2022（2） 
专利权人 HENAN HAINAD.（5） NINGXIA QING.（2）

High-barrier heat-resistant solvent-free polyurethane composite material useful as film lamination in packaging composite field of e.g. daily chemical, comprises e.g. polyurethane prepolymer, graphene modified polyol, polyester polyol, nano-silicon dioxide modified polyether polyol and isocyanate.

HE C, TIAN L, WEN Y

Polymer layer derived composition useful in a display device, comprises e.g. polyborondimethylsiloxane, benzoyl peroxide, fumed silica, glass fibers, glass powder, carbon nanotubes, graphene oxide, carbonyl iron, calcium carbonate, zinc oxide, silicone elastomer and polydimethylsiloxane.

HWANG S, LEE J, WU X, KIM J, KIM Y, SHIN H, YU W, YU W R, SHIN H J, SONG K Y, KIM J S, OH H J

Addition-type organic silicon heat-conducting adhesive masterbatch comprises organic silicon monomer I, organic silicon monomer II, blocking agent, catalyst I and high heat-conducting filler.

HAN Y

Preparing high heat-resistant liquid crystal polymer resin, by transesterifying prepolymers obtained by melt polycondensation of p-hydroxybenzoic acid, hydroquinone, 6-hydroxy-2-naphthoic acid and terephthalic acid, and solid-state polymerizing obtained liquid crystal polymer and inorganic filler.

XU L, YU R, ZHANG D

Preparing high-frequency transmission liquid crystal polymer film useful for e.g. electronics, comprises acetating monomers, crushing high-temperature polymerization of acetylated monomer and phenolic resin, mixing liquid crystal copolyester, cooling, slitting longitudinally and transversely.

XU L, YU R, ZHANG D

Producing heteroleptic polyhedral oligomeric silsesquioxane (POSS) in single vessel for composition used as e.g., coating by charging a reaction vessel with solvent, organosilane, water, and base, adding a suitable acid and separating salt.

LICHTENHAN J D, HAIT S B, JOSEPH D L, SUKENDUBY H

Photosensitive polyimide resin composition comprises photosensitive polyimide derivative, photoinitiator, free radical polymeric compound, solvent, alumina, graphene, inorganic clay, silicon oxide and zinc oxide.

HUANG T, ZHUANG C, SHI Y, XIE K, HUANG T C, CHUANG C C, SHIH Y C, HSIEH K H

Flame retardant material comprises e.g. polyether polyol, toluene diisocyanate, nanometer white carbon black, deionized water, dimethyl methyl phosphonate, graphene oxide, barium titanate and nano-zinc oxide.

WANG X, WEN Y, WANG L

Composite absorbent porous material comprises e.g. polyether polyol, toluene diisocyanate, nano carbon solution, nano white carbon black, deionized water, dimethyl methyl phosphonate, graphene oxide and barium titanate.

WANG X, WEN Y, WANG L

Polyurethane ferrite complex wave absorbing porous material comprises polyether polyol toluene diisocyanate nanocarbon sol nano white carbon black deionized water dimethyl methyl phosphate graphene oxide ferrite and silicon carbide.

WANG X, CHENG X, WEN Y