国家/地区 中国（5） 日本（4） 美国（3） 德国（2） 世界知识产权组织（2）
IPC部 C（8）
IPC大类 C23（8） C01（6） B32（2）
H01（2）
IPC小类 C23C（8） C01B（6） B32B（2）
H01B（2）
IPC C23C014/06（8）
发明人
公开年 2013（8）
申请年 2013（4）  2011（2）  2012（2） 
专利权人

Film-forming apparatus for forming graphene film on film-forming target e.g. metallic foil, has roll-to-roll mechanism which provides tensile force relaxation unit that relaxes tensile force applied to transported film-forming target.

KOBAYASHI T, SHIMIZU K, KADONO K, MIZUGUCHI Y, MURAKAMI Y, MIZUKUCHI Y, SUMINO K

Making strip shaped graphene layer used in semiconductor devices e.g. sensor, involves providing carbon nanotube structure comprising film on substrate surface, implanting carbon ions into substrate, and annealing substrate to obtain layer.

LIN X, JIANG K, FAN S

Manufacturing electrical conductor used in e.g. cables and printed circuit boards involves providing base substrate; providing foil; depositing graphene layer on foil to define layered structure; and depositing structure on base substrate.

MARTENS R I

Manufacture of graphene structure used in electronic device, involves providing catalyst metal layer on insulation film layer, supplying carbon in plasma state under specified conditions, and forming graphene layer.

EGAWA T, FUJITA K

Graphene nano-conductive iridium-catalytic thin film preparation method, involves connecting vacuum chamber shell with common anode, obtaining graphene nano conductive iridium catalytic film, and obtaining iridium plate.

CHEN Z, HE J, LI B, WANG L, NIE L

Manufacture of hexagonal boron nitride film used for graphene optoelectronic device, involves carrying out physical vapor deposition of boron atoms from solid boron source on substrate.

CHEN H, XU M

Manufacture of transparent conductive component used for transparent electrode for touch panel, involves forming graphene layer on metal foil, and forming resin layer comprising reactive-curable resin composition on graphene layer.

INOUE T, INOUE M, TAMARU H, TSUJIMOTO H, MINAMI N

Formation of graphene layer for electrode of e.g. emitter layer system, involves forming amorphous carbon layer on substrate by physical vapor deposition, and carrying out flash annealing in atmosphere of controlled composition.

SCHREIL M, BURGHART M, KAUFMANN M