国家/地区 |
日本(8)![]() |
IPC部 |
B(8)![]() |
IPC大类 |
B01(8)![]() |
IPC小类 |
B01D(8)![]() |
IPC |
B01D071/02(8)![]() |
发明人 |
CHOI K(2)
HEIGHT M(2)
PARK H(2)
PARK H G(2) |
公开年 | 2017(3) 2022(2) |
申请年 | 2016(2) 2017(2) 2021(2) |
专利权人 | HEIQ MATERIA.(2) |
TSURU T, KANESASHI M, NAGASAWA H
HIROTAKA S, YASUHIKO T, MOTOYUKI H, MASASHI M, SAKUMA H, TADA Y, HIROOKA M, MARUYAMA M
CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H
FUKUYO TOMOYUKI, MORELOS GOMEZ AARON, CRUZ SILVA RODOLFO, ENDO MORINOBU
PARK H G, HEIGHT M, CHOI K, PARK H
ZHENG S, KITAHARA I, SIDDIQUI O, YAMASHIRO Y, LIN W, ERICSON J, ROMERO R, WANG P, NOUMI S, BARTELS C R, HSIEH W, HIROSE M, KOBUKE M, ERICKSON J, OOU M
LAI Y L, CHANG C C, YAN S Y, HSU J N, KUO C N, YEN S I, LAI Y, ZHANG Z, YAN S, XU R, GUO J
RAVEENDRANNAIR R, SU Y, GEIM A, RAVEENDRAN N R