国家/地区 韩国（8）
IPC部 C（8）
IPC大类 C01（8） G03（3）
IPC小类 C01B（8）
IPC C01B032/194（3） G03F001/62（3） C01B032/05（2）
C01B032/184（2） G03F001/22（2）
发明人 KIM K S（8）
公开年 2022（8）
申请年 2021（4）  2022（4） 
专利权人 GRAPHENELAB .（3） FINE SEMITEC.（2） KOREA INST I.（2）

Infrared adaptive transparent camouflage film comprises substrate portion, graphene layer on substrate portion, electrode layer spaced apart from graphene layer, and ion gel layer formed on or between graphene layer and electrode layer.

LIM M K, KIM H D, KIM K S, KIM J H, JUNG H J, LEE H J, HYUN S M, LIM M, KIM K, KIM J

Producing film-type carbon material, comprises e.g. mixing epoxy resin and grapheme, preparing carbon material precursor having continuous skeleton, and heat-treating to carbonize film-type carbon material precursor.

KIM J P, KIM K S, CHOI D Y

Producing continuous skeletal porous carbon material used as energy storage materials i.e. supercapacitor anode material, comprises e.g. mixing epoxy resin and nano-carbon to form carbon precursor, and adding pore former to carbon precursor.

KIM J P, KIM K S, CHOI D Y

Manufacturing graphene thin film for pellicle material using ozone gas useful in semiconductor devices comprises forming graphene on the upper surface of substrate, exposing graphene layer to ozone, and heat-treating and etching.

LEE G H, KWON Y, WOOK Y B, MOON S I, MOON J, KIM K S, LEE S M

Manufacture of shadow mask, involves forming buffer layer, depositing metal layer, forming amorphous carbon layer and crystalline carbon layer, removing amorphous carbon layer and metal layer, and separating buffer layer and crystalline carbon layer.

MOON S I, KWON Y, WOOK Y B, MOON J, KIM K S, LEE S M

Pellicle film used for extreme UV lithography, comprises boron nitride nanostructure layer.

CHOI J H, CHO S J, YU L, KIM C, LEE S Y, SEO K W, KIM K S, MOON S Y, KIMCHUNG, SEO K

Etchant composition to manufacture graphene with low sheet resistance, comprises sulfuric acid, hydrogen peroxide, purified water, N-heterocyclic aromatic compound e.g. benzotriazole, and aromatic boric acid e.g. phenyl boric acid.

MOON J, KWON Y, WOOK Y B, LEE S M, MOON S I, KIM K S, LEE G H, HYUN D, SIMSUJIN, SHIM S J, HYUN D S, YOO B W, KWON Y D, MOON J T

Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.

CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W