国家/地区 韩国（10） 美国（2） 世界知识产权组织（2）
IPC部 G（5） H（4） B（2）
C（2）
IPC大类 G03（5） H01（4）
IPC小类 G03F（5）
IPC G03F001/22（4） G03F001/62（4）
发明人 KIM J K（10）
公开年 2022（10）
申请年 2021（5）  2020（4） 
专利权人 FINE SEMITEC.（5）

Electromagnetic wave absorber for aircraft doors, comprises composite material of sandwich structure in which surface material is laminated on both sides of conductive core material.

KIM J K, CHOI K

Pellicle film for extreme ultraviolet lithography, comprises a core layer and a first capping layer and second capping layers that are respectively coupled to upper and lower surfaces of the core layer, and a healing layer is formed on grain boundaries.

YU L, KIMCHUNG, CHO S J, KIM K S, LEE S Y, SEO K, CHOI J H, MOON S Y, KIM J K

Reduction of heterogeneous metal hydrogenation catalyst involves charging catalyst precursor supported on carrier with heterogeneous metal compound into reactor, reducing heterogeneous metal compound included in catalyst precursor by increasing temperature of reactor and supplying reducing gas.

KIM J K, JEON B S, KWON K J, SIK J

Dissimilar coated steel plate useful in display device i.e. plasma display device, comprises grater, heat-insulating coating layer formed in first region of first surface of steel sheet and heat dissipation coating layer.

KIM J K, CHO J D

Porous pellicle frame for extreme ultraviolet lithography, has second frame that is provided with second inner surface and second outer surface in contact with first outer surface.

KIMCHUNG, YU L, CHO S J, KIM K S, LEE S Y, SEO K, MOON S Y, CHOI J H, KIM J K

Material used in composition for forming layer of anode used for all-solid secondary batteries, comprises metal-carbon composite containing carbon material and metal particles which are uniformly dispersed in carbon material.

KIM J, YANG J, CHO B, JUNG Y, KIM Y, HAN S, KIM J K, YANG J H, JUNG Y C, KIM Y C, HAN S I, HOON Y, CHO B K, CHAE C, HAN X, JIN R, ZHENG Y, ZHAO B, KIM Q

Method for manufacturing pellicle for extreme ultraviolet lithography, involves forming catalyst layer over silicon substrate, forming graphene layer over catalyst layer, and forming capping layer over side of graphene layer.

YU L, CHO S J, KIM K S, KIMCHUNG, SEO K, CHOI J H, MOON S Y, KIM J K

Producing pellicle, useful for extreme ultraviolet lithography, involves e.g. forming primary capping layer on one surface of substrate, forming bonding layer comprising amine group on primary capping layer, and forming core layer.

YU L, CHO S J, KIM K S, SEO K, MOON S Y, KIM J K

Positively-charged body for triboelectric generator, has two-dimensional material layer formed on silicon oxide layer.

KIM J K, BAIK J M, KIM J G

Producing pellicle for extreme ultraviolet lithography involves forming silicon carbide layer on one side of substrate, forming metal catalyst layer over the silicon carbide layer followed by removing metal catalyst layer.

YU L, CHO S J, KIM K S, SEO K W, MOON S Y, KIM J K, YOU J D, SEO K