国家/地区 韩国（9） 世界知识产权组织（4） 美国（2）
IPC部 G（5） C（4）
IPC大类 C01（4） G03（4）
IPC小类 C01B（4） G03F（4）
IPC G03F001/22（4） G03F001/62（4） C01B032/05（2）
C01B032/194（2）
发明人 KIM K S（9）
公开年 2022（8）
申请年 2021（9）
专利权人 FINE SEMITEC.（4） KOREA INST I.（2）

Method for manufacturing pellicle for extreme UV lithography, involves adjusting thickness of etch stop layer and another etch-stop layer.

YU L, KIMCHUNG, CHO S J, CHOI J H, KIM K S, LEE S Y, SEO K, MOON S Y, KIM J K

Producing film-type carbon material, comprises e.g. mixing epoxy resin and grapheme, preparing carbon material precursor having continuous skeleton, and heat-treating to carbonize film-type carbon material precursor.

KIM J P, KIM K S, CHOI D Y

Producing continuous skeletal porous carbon material used as energy storage materials i.e. supercapacitor anode material, comprises e.g. mixing epoxy resin and nano-carbon to form carbon precursor, and adding pore former to carbon precursor.

KIM J P, KIM K S, CHOI D Y

Pellicle film for extreme ultraviolet lithography, comprises a core layer and a first capping layer and second capping layers that are respectively coupled to upper and lower surfaces of the core layer, and a healing layer is formed on grain boundaries.

YU L, KIMCHUNG, CHO S J, KIM K S, LEE S Y, SEO K, CHOI J H, MOON S Y, KIM J K

Electronic device e.g. non-volatile memory device, has first and second nanoribbons that are arranged to cross each other, and nanoflake that leaves region in which first and the second NR intersect by external force, where NR are in contact with each other.

WON K, KIM K S, RYUMDUCK O

Etchant composition to manufacture graphene with low sheet resistance, comprises sulfuric acid, hydrogen peroxide, purified water, N-heterocyclic aromatic compound e.g. benzotriazole, and aromatic boric acid e.g. phenyl boric acid.

MOON J, KWON Y, WOOK Y B, LEE S M, MOON S I, KIM K S, LEE G H, HYUN D, SIMSUJIN, SHIM S J, HYUN D S, YOO B W, KWON Y D, MOON J T

Method for manufacturing ion detection sensor, involves applying ion-sensitive mixed layer preparation solution so as to cover portion of upper portion of source electrode and drain electrode to provide ion-sensitive mixed layer that responds to target ions.

CHO S M, CHO M G, KIM K S, OH H G, CHO M, OHHONGGI

Producing pellicle for extreme ultraviolet lithography involves forming silicon carbide layer on one side of substrate, forming metal catalyst layer over the silicon carbide layer followed by removing metal catalyst layer.

YU L, CHO S J, KIM K S, SEO K W, MOON S Y, KIM J K, YOU J D, SEO K

Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.

CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W