国家/地区 日本（8）
IPC部 C（8）
IPC大类 C01（8） C22（8） B21（6）
B82（5） C23（4） B32（3）
B01（2）
IPC小类 C01B（8） C22C（8） C22F（8）
B21B（6） B82Y（5） B32B（3）
C23F（3） B01J（2）
IPC C01B031/02（8）
发明人 CHIBA Y（7） CHIBA G（5） YOSHIHIRO C（4）
YAMAJI T（3） CHIBA YOSHIHIRO（2） TATSUYA Y（2）
公开年 2012（3） 2013（3） 2014（2）
申请年 2012（8）
专利权人 JX NIPPON MI.（8） NIPPON MININ.（6） NIPPON MININ.（5） NIPPON MININ.（3）

Rolled copper foil used for multilayer graphene manufacture comprises silicon or titanium in surface by X-ray photoelectron spectroscopy.

CHIBA Y

Rolled copper foil used for manufacture of graphene used for formation of graphene sheet used for e.g. conductive thin film of display element, has preset detection strength ratio in positive pole, under specified conditions.

CHIBA Y

Copper foil for manufacture of graphene used for e.g. separator, has sum total of crystal grain boundary length below preset value after heating under preset conditions in atmosphere containing hydrogen and argon.

YAMAJI T

Copper foil used for manufacturing graphene, comprises copper with specific purity.

CHIBA Y, ONO T, CHIBA G

Copper foil for manufacturing graphene, has specified arithmetic mean roughness in rolling parallel direction and rolling perpendicular direction.

CHIBA YOSHIHIRO, CHIBA Y, CHIBA G, YOSHIHIRO C

Copper foil for manufacturing graphene, has specified sum total of oxides and sulfides having diameter of below preset value before heating under hydrogen and argon-containing atmosphere.

CHIBA Y, YAMAJI T, YOSHIHIRO C, TATSUYA Y, CHIBA G

Copper foil for manufacturing graphene, has specified total number of oxide and sulfide having specified diameter with respect to elemental-analysis measurement of surface using scanning electron microscope.

CHIBA Y, YAMAJI T, YOSHIHIRO C, TATSUYA Y, CHIBA G

Copper foil used for manufacturing graphene, has glossiness or more than preset value, and average grain size more than preset value after being heated in atmosphere containing hydrogen and argon at specific conditions.

CHIBA YOSHIHIRO, CHIBA Y, YOSHIHIRO C, CHIBA G