国家/地区 美国（17） 韩国（12） 日本（9） 世界知识产权组织（8） 中国（5） 德国（4） 欧洲专利局（EPO）（4） 英国（3） 台湾（2）
IPC部 C（25）
IPC大类 C01（25）
IPC小类 C01B（25）
IPC C23C016/26（25）
发明人 HUNLEY D P（2） MARTENS R I（2） STRACHAN D R（2）
公开年 2013（25）
申请年 2012（15）  2011（5）  2013（5） 
专利权人 SAMSUNG ELEC.（3） UNIV SUNGKYU.（3） INT BUSINESS.（2） PANASONIC CO.（2）
TE CONNECTIV.（2） TYCO ELECTRO.（2） UNIV KENTUCK.（2） UNIV SUNGKYU.（2）

Structure useful to shield electromagnetic disorders for shielding electromagnetic radiation, comprises thin layer of graphene and flexible substrate, in which thin layer of graphene is applied on flexible substrate and is doped with dopant.

AVOURIS P, GARCIA A V, SUNG C, XIA F, YAN H

Formation of graphene film used for e.g. electronic device, involves performing reduction process by heating metal film in atmosphere containing hydrogen gas, carrying out graphene film growth process, and cooling.

YOSHII S, NOZAWA K, MATSUKAWA N

Composition, useful in an electronic device, spintronic device or optoelectronic device, comprises ordered film of boron nitride containing multiple layers, where the film has a major surface, and a layer of graphene formed on major surface.

KELBER J A

Manufacturing electrical conductor used in e.g. cables and printed circuit boards involves providing base substrate; providing foil; depositing graphene layer on foil to define layered structure; and depositing structure on base substrate.

MARTENS R I

Formation method for transparent conductive film, involves forming transparent conductive film comprising sheet-like graphene, by sintering coated graphene ink to base-material surface at predetermined temperature.

TAKEI H, SAKIO S, SATO M, HIRAOKA K, IKEDA S, SAKAO Y, OTAKE F

Preparing multilayer article from semiconductor substrate involves forming metal film on front of substrate; forming layer of boron nitride; and forming layer of graphene between substrate and the back metal film surface.

SEACRIST M R, BERRY V, NGUYEN P T

Producing a graphene to make transparent electrode of e.g. optical detector, comprises depositing catalyst on substrate, heating substrate by vapor deposition of carbon contained in catalyst, cooling heated substrate and etching.

SONG Y W, LIM J A, KANG D S, KIM W J

Method for forming film of graphene involves placing substrate in processing chamber at reduced pressure, performing surface treatment process on portion of substrate, and providing carbon-containing material in processing chamber.

BOYD D A

Manufacturing electrical conductor, comprises providing substrate layer, depositing surface layer on substrate layer, and depositing graphene layer on substrate layer.

SULLIVAN M M E, HILTY R D, MARTENS R I, ZHENG M, HEMOND J H B, LIU Z, SULLIVAN MALERVY M E, SULLIVAN MALERVY M, HILTY R, MARTENS R, HEMOND J, SULLIVANMALERVY M E

Forming graphene film (on surface of substrate) used in e.g. lasers, comprises locating carbon source at or in vicinity of surface, controlling ambient conditions, applying temporary change of condition at localized site and controlling.

DONG G