国家/地区 美国（26）
IPC部 C（26）
IPC大类 C23（26） C01（19） B82（14）
H01（9） B01（5） H05（3）
B32（2） C08（2） C09（2）
C25（2） C30（2） G01（2）
IPC小类 C23C（26） C01B（19） B82Y（14）
H01L（7） B01J（5） B32B（2）
C01G（2） C08K（2） C25D（2）
C30B（2） H01B（2） H05H（2）
IPC C23C016/48（26）
发明人 NAGEL C J（6） BRODEUR C L（5） NAM W（5）
WON D（5） CHIU P（2） QIU B（2）
公开年 2021（5） 2012（3） 2013（3） 2016（3） 2017（3） 2022（3） 2019（2）
申请年 2016（4）  2022（4）  2019（3）  2020（3）  2011（2）  2012（2）  2014（2）  2021（2） 
专利权人 QUANTUM ELEM.（6） NPS CORP（5） HANWHA AEROS.（3） HANWHA TECHW.（2）
UNIV SINGAPO.（2）

Process for instantiating elemental metal within ultramicro pore of nanoporous carbon powder composition involves initiating gas flow in reactor assembly, reactor chamber containing nanoporous carbon powder, first porous frit, second porous frit, reactor head space, and computer processing unit.

BRODEUR C L, NAGEL C J

Digital formation of two-dimensional materials structures used for electronic components, involves generating donor substrates containing back surface and front surface, applying coating to front surface, and irradiating coating containing donor material.

ZERGIOTI I, PAPAZOGLOU S, ZACHARATOS F, LOGOTHETI A, PESQUERA A, ZURUTUZA A, NAVEH D

Reactor assembly comprises gas inlet and one or more gas outlets and reactor chamber containing nanoporous carbon material arranged within cup and covered with cap, where first porous frit defining floor of reactor chamber arranged within cup and covered with cap, and second porous frit.

BRODEUR C L, NAGEL C J

Plasma enhanced chemical vapor deposition method used in semiconductor structure, comprises turning on radio frequency source of radio frequency system to decompose aromatic hydrocarbon precursor into multiple active radicals at specific frequency to form graphene layer on magnetic layer.

WU Z, NI I, XU Y, HUANG J, WU C, HSU Y, HUANG J Z, HSU Y H

Reactor assembly comprises gas inlet, gas outlets, reactor chamber, porous frits having porosity and comprising nanoporous carbon material, reactor head space, reactor assembly lamps, and computer processing unit.

NAGEL C J, BRODEUR C L

Performing quantum printing metal within nanoporous carbon powder involves adding nanoporous carbon powder into reactor assembly (RA) comprises gas inlet and one or more gas outlets, reactor chamber containing nanoporous carbon powder.

NAGEL C J

Reactor assembly comprises gas inlet and one or more gas outlets, reactor chamber containing nanoporous carbon material, first porous frit defining floor of reactor chamber, second porous frit defining ceiling of the reactor chamber.

NAGEL C J, BRODEUR C L

Seed layer for inducing nucleation to form layer of material used for fabricating semiconducting devices, comprises layer of two-dimensional monolayer amorphous material with disordered atomic structure to form electric potential wells for bonding adatoms to seed layer by van der Waals interaction.

OEZYILMAZ B, TOH C T, ABIDI I H, OJIYLMAZ B, TOH C, ZHUO Z, OZYILMAZ B

Composition useful as catalysts and electrodes, comprises a nanoporous carbon powder comprising nanopores having disposed in it copper metal nanostructures and an elemental copper nanowires.

NAGEL C J, BRODEUR C L, NAZEL C A J, BRODARD C L

Graphene synthesis method comprises disposing substrate including metal thin film in inner space of graphene synthesis chamber, depressurizing inner space, supplying gas of carbon into inner space using gas supplier and irradiating light.

WON D, NAM W