国家/地区 中国（3） 韩国（3） 欧洲专利局（EPO）（2） 美国（2） 世界知识产权组织（2）
IPC部 C（8）
IPC大类 C01（8）
IPC小类 C01B（8）
IPC C01B032/186（8）
发明人 LIU Z（2）
公开年 2021（8）
申请年 2019（4）  2020（2）  2021（2） 
专利权人 BEIJING GRAP.（2）

Industrial mass production of vertical graphene composite carbon felt involves soaking carbon felt in acid solution, vibrating, repeatedly washing soaked carbon felt with deionized water, drying, and putting carbon felt on roller device.

QIN C, LI T, WANG Q, LOU H, SHI L, LUO L, HUANG S

Large-area graphene continuous deposition apparatus, has classifier for sorting carbon particles generated in pyrolyzer by size, and injector configured to grow graphene layer by spraying particles selected by classifier onto titanium layer.

YOUN D H, GYU S, KIM T J

Two-dimensional material forming apparatus comprises substrate moving unit, and two-dimensional material forming unit for forming two-dimensional material by spraying carbon gas on substrate moved by substrate moving unit.

SHIN U C

Continuously or semi-continuously producing graphene by introducing particles comprising core into stationary deposition chamber and subjecting to plasma enhanced chemical vapor deposition using carbon-containing gas to form solid graphene.

BEUKES J A, HUANG F

Apparatus for manufacturing one-way roll-to-roll graphene film, has tension control roller that changes direction, and lower chamber that includes winding roller that transfers catalytic metal film from tension adjusting roller is wound.

KI K Y

Depositing layer of carbon nanostructures on substrate by providing substrate in processing chamber, providing processing gas in processing chamber having carbon monoxide gas and creating and sustaining gaseous plasma in processing chamber.

ZAPLOTNIK R, MOZETIC M, PRIMC G, VESEL A, HORI M, ODA O

Graphene composite metal foil double-side growth device has chemical vapor deposition furnace comprising plasma glow region and heating growth region, and connected with unwinding shaft and winding shaft on both sides.

PENG H, CAO F, YANG H, WANG K, WANG X, LIU Z

Method for preparing graphene wafer in batches using carrier, involves using chemical vapour deposition process to prepare graphene film on substrate, in which angle between gas flow direction and substrate is provided with specified value.

LIU Z, JIANG B, GAO X