国家/地区 世界知识产权组织（21）
IPC部 C（21）
IPC大类 C23（21）
IPC小类 C23C（21） C01B（18） H01L（16）
B82Y（11） B32B（5） B05D（4）
C30B（4） H01M（4） C01G（3）
C25D（3） H01B（3） B01J（2）
B23K（2） B82B（2） C03C（2）
IPC C23C016/56（21）
发明人 THOMAS S（3） GLASS H（2） GUINEY I（2）
TYLER M（2） WALLIS R（2）
公开年 2012（4） 2021（4） 2017（3） 2022（2） 2023（2）
申请年 2020（4）  2022（4）  2011（3）  2017（3）  2009（2）  2012（2） 
专利权人 EMPIRE TECHN.（2） PARAGRAF LTD（2）

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Formation of graphene layer for semiconductor device, involves exposing substrate comprising conductive and dielectric materials to plasma to clean conductive material, and exposing substrate to another plasma to form graphene layer.

MEBARKI B, CHUA T C, VALENCIA C W, LEE J J, TANG X, CHEN X

Digital formation of two-dimensional materials structures used for electronic components, involves generating donor substrates containing back surface and front surface, applying coating to front surface, and irradiating coating containing donor material.

ZERGIOTI I, PAPAZOGLOU S, ZACHARATOS F, LOGOTHETI A, PESQUERA A, ZURUTUZA A, NAVEH D

Manufacture of steel strip for battery case, involves performing continuous roll-to-roll process by joining leading edge of coil of nickel-plated steel strip to trailing edge of preceding coil of nickel-plated steel strip in joining section.

WITTEBROOD A J

Manufacture of dense layer of electrochemical device, involves providing substrate and suspension of non-agglomerated nanoparticles of material having specific particle size distribution, depositing layer on substrate, drying and densifying.

GABEN F

Encapsulating graphene in semiconductor substrate, comprises selectively depositing graphene on metal layer, depositing metal oxide over graphene by thermal-based deposition technique, and depositing hermetic barrier over metal oxide.

VARADARAJAN B N, NARKEVICIUTE I, SHARMA K

Producing polymer-coated graphene layer structure involves e.g. adding substrate to reaction chamber, supplying flow comprising precursor compound to form graphene layer structure, heating and spin-coating using polymer or polymer precursor.

GLASS H, GUINEY I, TYLER M, WALLIS R, THOMAS S, TAYLOR M

Production of electronic device such as integrated circuit board, involves providing substrate, supplying flow comprising precursor compound, selectively laser ablating graphene, and selectively laser ablating surface of substrate.

GLASS H, GUINEY I, TYLER M, WALLIS R, BAINES R, THOMAS S

Preparing vertical branched graphene used as catalyst support in e.g. electrocatalytic process involves treating pristine vertical graphene with inert plasma in absence of introduced carbon source to develop vertical branched graphene.

HAN Z, TSOUNIS C, AMAL R

Manufacture of transparent conductive graphene hybrid uses in e.g. photonics, involves functionalizing polymethyl methacrylate/Graphene hybrid, oxidizing and forming substrate, applying, removing polymethyl methacrylate, and forming hybrid.

LOCK E H, CHARIPAR N A, PIQUE A