国家/地区 | 中国(14) |
IPC部 | C(14) B(3) |
IPC大类 |
C23(14)![]() |
IPC小类 |
C23C(13)
B22F(3)
C09K(3)
C01B(2) |
IPC |
C23C004/06(7)
C23C016/26(3)
B22F001/00(2)
C09K011/64(2) C23C004/126(2) C23C016/02(2) C23C016/455(2) |
发明人 |
ZHANG H(14)![]() |
公开年 |
2017(14)![]() |
申请年 |
2017(14)![]() |
专利权人 | AECC BEIJING.(8) UNIV TAIYUAN.(2) |
Device used e.g. for etching continuous substrate and graphene comprises feeding and etching device.
ZHANG H, LI T, TAN H
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z