国家/地区 中国（8）
IPC部 B（8）
IPC大类 B05（8）
IPC小类 B05D（8）
IPC B82Y040/00（4） C23C016/26（4） B05D007/14（3）
B82Y030/00（3） B05D003/02（2） B05D003/10（2）
B05D005/12（2） B05D007/00（2） B05D007/24（2）
C01B031/02（2） C23C014/24（2） C23C028/00（2）
C23F001/00（2） G01N021/65（2） H01B001/04（2）
发明人 WANG L（2） ZHANG J（2）
公开年 2018（2） 2022（2）
申请年 2011（2）  2017（2）  2021（2） 
专利权人

Preparation of graphene-encapsulated ultra-thin nickel-63 radiation source film used in preparation of Schottky junction stacked radiation cell, involves preparing nickel chloride film, and putting graphene/nickel chloride/graphene film in vacuum environment for reduction treatment.

WANG X, WANG L, CHEN Z, YANG Y, ZHANG J, SU C, FENG H, LI P, WU W, LUO T, ZHOU C

Method for manufacturing flexible strain sensor used for detecting human body motion, involves etching to remove metal mesh screen to ensure flexibility of sensing material if substrate is non-metal stretchable mesh screen.

CHEN X, LI Z, WANG M, MA Y

Nano-gold tube composite film coated with graphene oxide useful for preparing three dimensional flexible Raman enhanced substrate, comprises hollow tubular nano-gold film layer and a graphene oxide layer.

LIN Y, WANG L, HE H, DING Z, TIAN X

Graphene-based flexible-enhanced Raman substrate, comprises single layer of graphene, where graphene layer is provided with metal plating layer, and polymer is coated on metal plating layer.

ZHANG J, TONG L, TIAN H, ZHANG N

Manufacturing graphene film used for manufacturing pellicle involves coating graphene with protective film, removing base material by wet etching with etching liquid and dissolving protective film using solvent having lower surface tension.

YANASE Y, YANASE M, LIANG L

Method for manufacturing transparent conductor in electric devices, involves removing copper support by bringing support into contact with non-acidic copper-etching solution after forming transparent resin layer to expose graphene film.

NAITO K, AKASAKA Y, YANG T, YOSHINAGA N, YANG T Y, AKITA M

Method for preparing patterned graphene film, involves soaking substrate in acetone or photoresist peeling solution to remove photoresist or poly(methyl methacrylate) on graphene film to obtain patterned graphene film.

DAI T, YAO Q, ZHANG F

Manufacturing graphene comprises preparing a subject substrate, forming a metal thin film, supplying a carbon source material, heating, diffusing carbon atoms, and forming graphene on the subject substrate.

KWON S, PARK K, YOON E, KWAK J, KWON S Y, YOON U