国家/地区 日本（44）
IPC部 C（44）
IPC大类 C01（44）
IPC小类 C01B（44）
IPC C01B032/182（44）
发明人 AIDA H（5） AOTA N（5） IFUKU R（3）
MATSUMOTO T（3） BEDWORTH P V（2） HEISE S E（2）
HOWE W R（2） HUNT J H（2） JOUVRAY A（2）
LI A W（2） SINTON S W（2） SWETT J L（2）
TEO K B K（2） WANG H（2） XIE H（2）
公开年 2017（16） 2015（12） 2018（4） 2016（3） 2021（3） 2013（2）
申请年 2015（10）  2016（9）  2014（8）  2017（6）  2013（2）  2019（2）  2020（2）  2021（2） 
专利权人 NAMIKI SEIMI.（5） NAT INST ADV.（3） TOKYO ELECTR.（3） AIXTRON SE（2）
BOEING CO（2） CORNING INC（2） LOCKHEED MAR.（2） SHANGHAI INS.（2）
UNIV CALIFOR.（2）

Structure useful in sliding member and connector, comprises structure in which nanocarbon material is arranged on surface of metal.

KAZUOMI S, KAZUHIRO T, YASUHIRO Y, MAYUMI K, RYOTA Y, SATO K, TOKUNAGA K, YUZUHARA Y, KOSAKA M, YUGE R

Encapsulating graphene in semiconductor substrate, comprises selectively depositing graphene on metal layer, depositing metal oxide over graphene by thermal-based deposition technique, and depositing hermetic barrier over metal oxide.

VARADARAJAN B N, NARKEVICIUTE I, SHARMA K

Method for manufacturing graphene-coated steel sheet, involves modifying steel sheet to have negative charge and forming of first graphene oxide layer is performed using graphene oxide dispersion modified with amine group.

YOO H, KIM J, BAEK J, BYEON C, YOO H J, SU K J, BAEK J H, BYEON C S, BAI J, LIU H

Composite powder useful for powder metallurgy and additive manufacturing processes, comprises particles with a core of an iron based material and a coating of a graphene based material.

JANSSON U, TIDEN S, TAHER M, DIAZ L, REMONEN T, JANSSEN U

Method of forming graphene on substrate, involves treating surface of substrate placed in reaction chamber with plasma, and growing graphene on surface of substrate by plasma enhanced chemical vapor deposition (PECVD).

SHIN K, KIM C, YAMAMOTO K, LEE C, SONG H, LEE E, BYUN K, SHIN H, AN S, SHEN J, JIN C, SHAN B, LI C, SONG X, LI Y, BIAN Q, SHEN X, AN X, SHIN K W, LEE C S, SONG H J, BYUN K E, SHIN H J, AHN S J

Manufacture of graphene structure used for wiring, involves preparing substrate to be processed, and forming graphene structure on substrate surface by plasma chemical vapor deposition using plasma of process gas containing oxidizing gas.

RYOTA I, TAKASHI M, IFUKU R, MATSUMOTO T

Graphene nanoribbon used in a semiconductor device which his useful in electronic devices e.g. computers, smartphones, portable telephones and tablet terminals comprises a chiral edge to which an electron-withdrawing group is bonded.

OHTOMO M, OTOMO M

Manufacturing graphene film used for manufacturing pellicle involves coating graphene with protective film, removing base material by wet etching with etching liquid and dissolving protective film using solvent having lower surface tension.

YANASE Y, YANASE M, LIANG L

Electrical contact for forming e.g. connector, is produced using material including layer comprising carbon material which is single graphene layer or graphene laminate on base material comprising metal material having preset resistivity.

MORI K, SHIMIZU T

Production of graphene used as wiring material, involves supplying carbon-containing gas and metal catalyst into chamber and reactivating catalyst by supplying process gas and carbon-containing gas to regrow graphene on catalyst surface.

IFUKU R, MATSUMOTO T