国家/地区 韩国（33）
IPC部 C（33） H（19） B（9）
D（3） G（2）
IPC大类 C01（33） H01（19） B01（7）
C23（7） B82（2） C07（2）
D01（2）
IPC小类 C01B（33）
IPC C01B032/184（7） H01M004/62（7） C01B032/182（6）
C01B032/186（6） C23C016/26（6） C01B032/194（5）
H01L021/02（5） H01L021/768（5） H01M004/02（5）
H01M004/36（5） H01M004/38（5） H01M010/052（5）
C01B032/05（4） H01L023/532（4） H01M004/587（4）
发明人 SHIN K（4） LEE C（3） LEE C S（3）
SHIN K W（3） BYUN K（2） BYUN K E（2）
KIM D W（2） KIM S（2） KIM Y（2）
KIM Y H（2） LEE K（2） MYUNGJUN S（2）
PARK H（2） PARK J H（2） PARK S（2）
公开年 2023（33）
申请年 2022（33）
专利权人 SAMSUNG ELEC.（4） KOREA ADVANC.（2） LG ENERGY SO.（2） UNIV SEOUL N.（2）

Conductive material slurry used in secondary battery for electric vehicles, comprises conductive material, and dispersing agent dispersing conductive material.

HAN J, HUH C, YANG H C, LEE J, KIM H, KYUNG H, CHUL H, LEEJOOCHUL, CHUL K

Porous carbon material used in positive electrode for lithium-sulfur battery, has specific surface area and impurities removed through pretreatment using microwaves.

SONG M, PARK I, CHOI R, LEE H, KIM Y, PARK S, YANG S, MYUNGJUN S, PARK I T, KIM Y H

Producing closed-shell thermally reduced graphene oxide useful as material for soundproofing and buoys, comprises e.g. acid treating graphite, heat-treating graphene oxide, and coating thermally reduced graphene oxide with coating agent.

CHOI J Y

Pellicle used for reticle for extreme-UV exposure, comprises pellicle film through which extreme-UV rays transmit and support frame for supporting pellicle film, where pellicle film comprises multilayer thin film structure.

KIM Y H, KIMYONGHWAN

Porous silicon-carbon composite used as anode active material for lithium secondary battery, comprises core-shell structure containing silicon particles and carbon, core including silicon particles, and shell including carbon layers.

LEE J H, LIM S W, PARK H J, NAM S J, LIM H H, LIM J C, HYUN L J, IMSUNGWOO, PARK H, JIN N, HEE L, LIM J

Silicon-based nanosheet produced by acid-treating metal-layered silicon-based compound to prepare proton-layered silicon-based compound, and exfoliating, useful in composite sheet for electronic devices, and supercapacitor.

KIM S, SEUNGBO K, JUNG H J

Hard mask film used in etching process for manufacturing semiconductor device, comprises first graphene layer, first amorphous carbon layer on first graphene layer, second graphene layer on first amorphous carbon layer, and second amorphous carbon layer on second graphene layer.

KIM Y, OH S, AN S, AHN S J, OH S R, KIM Y U, AN X

Polyimide film is obtained by imidization reaction of polyamic acid containing quinoline and beta-picoline as imidation catalyst and acetic anhydride as dehydrating agent.

JUNG H, WON D, WON D Y

Catalyst useful for producing hydrogen comprises aluminum oxide or activated carbon, platinum supported in pores of aluminum oxide or activated carbon, and molybdenum mixed with platinum and supported in pores.

LEE K, JISU J, KIM C H, PARK T, LEE S, JANG J S, PARK T I

Saturable absorber device for adjusting saturation threshold comprises optical waveguide and saturable absorber structure in which more than one-unit structures are arranged at predetermined intervals on one side of optical waveguide.

HEO D C, BAE Y M, SEOL S K, PYO J Y