国家/地区 美国（32）
IPC部 C（32）
IPC大类 C23（32）
IPC小类 C23C（32） H01L（15） C01B（13）
H01M（6） H01G（4） B82Y（3）
C09D（3） B05D（2） B23K（2）
B32B（2） C25D（2）
IPC C23C016/26（17） C23C016/02（10） H01L021/02（9）
H01L021/285（9） H01L021/768（8） C01B032/186（7）
H01L023/532（5） C23C016/44（4） C23C016/455（4）
C23C016/511（4） H01M004/36（4） H01M010/0525（4）
B82Y040/00（3） C23C016/505（3） C23C016/56（3）
发明人 LEE C S（5） LEE C（4） BYUN K（3）
BYUN K E（3） LANNING B（3） SHIN K（3）
SHIN K W（3） AHN S J（2） AN S（2）
ELSAYED K A M（2） IFUKU R（2） KIM D W（2）
KIM K（2） KIM Y（2） LEE J（2）
公开年 2023（32）
申请年 2022（27）  2021（3）  2023（2） 
专利权人 SAMSUNG ELEC.（8） APPLIED MATE.（3） LYTEN INC（3） TOKYO ELECTR.（2）
UNIV IMAM AB.（2）

Forming graphene involves pretreating surface for processing using one or more pretreating flowrates of substrate gas scavenging gas composition or annealing gas composition, in presence of one or more pretreating temperatures, to produce contaminant-depleted surface.

PHILPOTT R, BARAKET M, SHERRILL V

Article comprises polymer body, and metal coating on at least portion of outer surface of polymer body, where metal coating comprises plating metal and overlaying two-dimensional conductive nanoparticle and catalyst metal comprising copper, silver, platinum, or palladium.

ZWARTZ E G, WANG Y, HU N

Anode active material comprises carbon material, and silicon structure attached to carbon material, where silicon structure includes silicon nanoparticle, metal thin film formed on surface of silicon nanoparticle, and graphene coated on surface of metal thin film.

KIM Y H, SON M W, KIM Y, SUN M

Hard mask film used in etching process for manufacturing semiconductor device, comprises first graphene layer, first amorphous carbon layer on first graphene layer, second graphene layer on first amorphous carbon layer, and second amorphous carbon layer on second graphene layer.

KIM Y, OH S, AN S, AHN S J, OH S R, KIM Y U, AN X

Battery-powered analyte sensing system used in Three-dimensional (3D) printing techniques, comprises printed battery comprising anode, comprises non-toxic biocompatible metal, first carbon-based current collector in electrical contact with anode and 3D hierarchical mesoporous carbon-based cathode.

CHMIOLA J, SINGH S, LIM S H, COOK D, MONTALVO C, STOWELL M W, LANNING B

Material layer for, e.g. aero-engine applications, comprises porous synthesized carbon-containing composite materials, bonding layer, and hydraulically smooth surface interfacial layer comprising synthesized carbon-containing composite material(s).

STOWELL M, LANNING B

Preparing silicon-carbon composite particles involves providing carbon scaffold comprising pore volume, heating porous carbon scaffold, contacting carbon scaffold with silane feedstock gas, mole silicon in silicon-carbon composite is determined from silicon content in silicon-carbon composite.

PATEL R, TIMMONS C, SAKSHAUG A J, DHANABALAN A, COSTANTINO H R

Composition of matter includes one or more particles, where each particle independently comprises metal lattice having one or more coherent, and planar layers of graphene provided in the metal lattice.

LANNING B, JACOBSON D, SIENKO L, STOWELL M

Chuck assembly used in semiconductor device fabrication system, comprises chuck base includes lower base and upper base that is on lower base, ceramic plate on upper base, and isolator ring enclosing outer sidewall of lower base.

JUNG U, SHIN M, SUNG D, NA D, KIM D, KIM K, JEONG S, JUNG S H, KIMKYUNGSUN, KIM D W, SUNG D Y, SU S M, JUNGUNGYO

Depositing nanoscale-thin film in preselected area on substrate for area-selective atomic layer deposition based on electron beam patterning of chemical functional groups, involves depositing layer of functionalizing molecule onto or adjacent to first surface of substrate.

YOUNG M J, MASCHMANN M R