国家/地区 韩国（19） 世界知识产权组织（7） 美国（3）
IPC部 G（11） C（10） B（2）
IPC大类 C01（9） G03（8） C08（2）
C09（2） G01（2）
IPC小类 C01B（8） G03F（8） C08K（2）
C08L（2） G01N（2）
IPC G03F001/62（7） G03F001/22（6） C01B032/194（3）
C01B032/05（2） C01B032/184（2） C08K003/04（2）
G01N027/414（2）
发明人 KIM K S（19）
公开年 2022（19）
申请年 2021（8）  2022（6）  2020（5） 
专利权人 FINE SEMITEC.（7） GRAPHENELAB .（3） KOREA INST I.（3） FST CO LTD（2）
MCK TECH CO .（2）

High-performance coating film waterproofing composition comprises methyl acrylate-acrylonitrile copolymer, isocyanate group-containing silane coupling agent, titanium oxide, graphene dispersion and aluminum nitride.

KIM K S

Infrared adaptive transparent camouflage film comprises substrate portion, graphene layer on substrate portion, electrode layer spaced apart from graphene layer, and ion gel layer formed on or between graphene layer and electrode layer.

LIM M K, KIM H D, KIM K S, KIM J H, JUNG H J, LEE H J, HYUN S M, LIM M, KIM K, KIM J

Composite active material used as cathode for lithium battery, comprises core comprising lithium transition metal oxide, and a shell comprising metal oxide, carbonaceous material, and doped fluorine element.

KAPYLOU A, MOON J, SON I, KIM G, CHERNYSHOV D, MAH S, JO S, MOON J S, KIM G S, MAH S K, JO S N, ZHAO S, MA X, CHERNYSHYOV D, JIN G, MUN J S, SON I H, KIM K S, MA X G

Producing film-type carbon material, comprises e.g. mixing epoxy resin and grapheme, preparing carbon material precursor having continuous skeleton, and heat-treating to carbonize film-type carbon material precursor.

KIM J P, KIM K S, CHOI D Y

Producing continuous skeletal porous carbon material used as energy storage materials i.e. supercapacitor anode material, comprises e.g. mixing epoxy resin and nano-carbon to form carbon precursor, and adding pore former to carbon precursor.

KIM J P, KIM K S, CHOI D Y

Pellicle film for extreme ultraviolet lithography, comprises a core layer and a first capping layer and second capping layers that are respectively coupled to upper and lower surfaces of the core layer, and a healing layer is formed on grain boundaries.

YU L, KIMCHUNG, CHO S J, KIM K S, LEE S Y, SEO K, CHOI J H, MOON S Y, KIM J K

Manufacturing graphene thin film for pellicle material using ozone gas useful in semiconductor devices comprises forming graphene on the upper surface of substrate, exposing graphene layer to ozone, and heat-treating and etching.

LEE G H, KWON Y, WOOK Y B, MOON S I, MOON J, KIM K S, LEE S M

Manufacture of shadow mask, involves forming buffer layer, depositing metal layer, forming amorphous carbon layer and crystalline carbon layer, removing amorphous carbon layer and metal layer, and separating buffer layer and crystalline carbon layer.

MOON S I, KWON Y, WOOK Y B, MOON J, KIM K S, LEE S M

Pellicle film used for extreme UV lithography, comprises boron nitride nanostructure layer.

CHOI J H, CHO S J, YU L, KIM C, LEE S Y, SEO K W, KIM K S, MOON S Y, KIMCHUNG, SEO K

Porous pellicle frame for extreme ultraviolet lithography, has second frame that is provided with second inner surface and second outer surface in contact with first outer surface.

KIMCHUNG, YU L, CHO S J, KIM K S, LEE S Y, SEO K, MOON S Y, CHOI J H, KIM J K