国家/地区 韩国（11） 美国（2）
IPC部 C（7） G（5） B（3）
H（3）
IPC大类 G03（4） C08（3） H01（3）
B01（2） C01（2） C09（2）
IPC小类 G03F（4） C08K（3） C08L（3）
B01J（2） C01B（2） H01L（2）
IPC G03F001/22（4） G03F001/62（4） C08K003/04（3）
C01B032/184（2） C01B032/194（2） G03F001/64（2）
G03F007/20（2）
发明人 KIM S K（11）
公开年 2022（11）
申请年 2021（5）  2020（3）  2022（3） 
专利权人 KOREA ELECTR.（4）

Carbon quantum dots capable of electrochemical wireless diagnosis comprises hyaluronic acid, pluronic, polyethylene glycol, poly(2-(dimethylamino) ethyl methacrylate), carboxylmethylcellulose, colistin, and vancomycin.

PARK S Y, KIM S K, CHO H, LEE K B

Lithium secondary battery for electric vehicles, comprises a positive electrode comprising positive electrode mixture layer comprising positive electrode active material and lithium-cobalt-zinc oxide additive, negative electrode, and electrolyte.

KIM S K, OH S, KIM H, JO C H

Carbon composite material useful for building materials for heating and and electronic industry and electronic devices, comprises polymer resin and carbon material.

YANG C M, KIM J H, LEE Y S, RYEOL K N, KIM S K, RYU J S, LEE M W, NA W, MINGOOK K, PARK H B

Pellicle for extreme ultraviolet exposure, has pellicle layer that is provided with yttrium compound-containing layer containing ytterbium-based compound.

KIMHYUNGKEUN, KIM S K, MI K H, LIM H M, KIM H Y, JEONJUNHYUCK, LEE S M

Direct growth method of multilayer graphene through pressure heat treatment, comprises forming etch stop layer, forming metal catalyst layer, forming amorphous carbon layer and directly growing multilayer graphene on seed layer.

KIM H, KIM S K, MI K H, YOO C S, JOJINWOO, KIM H Y, JEONJUNHYUCK, YUNSUNGHO, SUNG K H, LEE S M

Performing low-temperature direct growth method of multilayer graphene for manufacturing pellicle for extreme ultraviolet lithography, involves forming etch stopper on substrate, and forming seed layer on etch stopper, where seed layer is selected from boron nitride, or boron carbon nitride.

KIM H Y, CHO J W, KIM H M, KIM S G, KIM H K, KIM H, MI K H, KIM S K

Pellicle i.e. consumable component for protecting mask from contaminants in lithography process for semiconductor or display manufacturing, has substrate whose central portion is formed with opening, and pellicle layer containing amorphous carbon and core layer, formed on support layer.

KIM H Y, CHO J W, KIM H M, KIM S G, KIM H K, KIM H, MI K H, KIM S K, JEONJUNHYUCK, LEE S M

Heat dissipation structure of graphene-based deep UV light emitting device package, has upper sub-mount substrate that is arranged on upper polymer layer and is formed of insulator, and first and second electrode bonding pads are patterned on substrate.

SEONGTAEYEON, KIM J H, KIM S K

Carbon-based rubber composite comprises bromo isobutylene isoprene rubber and graphene nanoplates.

HWANG J Y, KANG S B, PARKSANGYOO, KIM S K

Plated molded product comprises molded thermoplastic resin composition and electrolytic plating layer formed on surface, where thermoplastic resin composition is styrene-based resin and additive for shortening plating.

HAN S, KANG B I, LEE J H, KIM S K