国家/地区 世界知识产权组织（26）
IPC部 C（26）
IPC大类 C01（26） C23（26） H01（13）
B82（6） B01（4） C30（3）
C08（2） C25（2） G02（2）
H05（2）
IPC小类 C01B（26）
IPC C23C016/455（26）
发明人 KIM Y K（3） HAN S H（2） JOUVRAY A（2）
KIM H K（2） LEE S J（2） MATSUMOTO T（2）
SEO J W（2） TEO K B K（2）
公开年 2013（6） 2015（4） 2017（4） 2021（4） 2014（2） 2016（2） 2022（2）
申请年 2013（5）  2014（4）  2015（3）  2017（3）  2021（3）  2016（2）  2020（2）  2022（2） 
专利权人 AIXTRON SE（2） KOREA ELECTR.（2） TOKYO ELECTR.（2）

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Wafer used to chemical vapor deposition growth of uniform graphene comprises planar silicon substrate, insulating layer provided across silicon substrate, and barrier layer provided across the insulating layer.

DIXON S, KAINTH J, JAGT R, GUINEY I, BADCOCK T J

Processing semiconductor by generating plasma of carbon- and hydrogen-containing precursors, forming layer of graphene on substrate, and halting flow of carbon-containing precursor while maintaining plasma with hydrogen-containing precursor.

INGLE N K, MALLICK A B, SINGHA R S, WANG J, ROY S S

Method for forming film e.g. graphene film on substrate, involves supplying aromatic hydrocarbon gas having functional group, to substrate on which base film is formed, and activating aromatic hydrocarbon gas adsorbed on surface of base film by plasma of reaction gas containing rare gas.

MATSUMOTO T, IFUKU R

Structure e.g. porous metal-coated structure used for e.g. catalytic application, comprises substrate comprising activated adsorbent material, and metal material deposited on substrate.

PEPIN P, ETHRIDGE K, THOMSON C, HOLBROOK B, ESRIDGE K

Coating metal workpiece e.g. electrical connector, involves exposing workpiece to carbon-containing precursor gas and hydrogen gas at preset flow rate and total gas pressure, and exposing to carbon-containing precursor gas and carrier gas.

ADAMS H J

Depositing graphene on a metal surface of substrate by providing substrate including metal surface in reaction chamber, flowing hydrocarbon precursors into reaction chamber and toward the substrate, and generating radicals of hydrogen.

VARADARAJAN B N, NARKEVICIUTE I

Electrical contact for forming e.g. connector, is produced using material including layer comprising carbon material which is single graphene layer or graphene laminate on base material comprising metal material having preset resistivity.

MORI K, SHIMIZU T

Graphene composite electrode used for manufacturing electrochromic device, consists of graphene layer, atomic layer formed on graphene layer, and transparent conductive layer formed on atomic layer.

KIM H K, KIM Y K, HAN S H, LEE S J, SEO J W

Manufacture of electrochromic device used as e.g. smart window, involves growing graphene on substrate, performing atomic layer deposition process on graphene layer, forming atomic layer, and forming conductive layer on atomic layer.

KIM H K, KIM Y K, HAN S H, LEE S J, SEO J W