国家/地区 中国（32）
IPC部 C（32）
IPC大类 C23（32）
IPC小类 C23C（32） C01B（17） H01L（5）
B65H（2） B82Y（2） C30B（2）
G01N（2） H01M（2）
IPC C23C016/46（32）
发明人 LIU X（3） TEO K B K（3） CUI H（2）
JOUVRAY A（2） LI Z（2） LIU S（2）
MA Y（2） WANG M（2）
公开年 2021（5） 2022（5） 2012（3） 2013（3） 2015（3） 2017（3） 2018（3） 2016（2） 2019（2）
申请年 2021（7）  2014（4）  2016（4）  2013（3）  2017（3）  2011（2）  2012（2）  2019（2）  2020（2）  2022（2） 
专利权人 AIXTRON SE（3） BEIJING GRAP.（2） UNIV JILIN（2）

Box type negative-pressure roll-to-roll preparation device, has protective gas and carbon source supply mechanism connected with box body to introduce carbon source and protective gas into box body.

WU Q, SONG S, MA Y

Preparation of two-dimensional chromium material involves mixing chromium source with additive material to form first gaseous precursor and processing sulfide source to form second gaseous precursor, and transferring first and second gaseous precursors to substrate and heating obtained substrate.

XIAO H, XU M

Composite base system for thin film deposition device, has first base comprising top surface and bottom surface opposite to each other, and radio frequency heating coil coaxially surrounded around second base.

LIU L, ZHENG D, XU C

Heating furnace for use in chemical vapor deposition reaction device, has graphite plate supporting wafer substrate, where one side surface used for substrate is provided with growth graphene.

XUE Z, CHEN Z, SHAN J, WANG M, SUN J, LIU Z

Graphene film preparation device useful for heating in pipe, comprises heating element, which is embedded in the quartz tube and forming heating cavity with quartz tube, the heating cavity is placed by substrate, and air supply assembly forming graphene film on the substrate.

QING F, LI X, HE Q

Method for manufacturing flexible strain sensor used for detecting human body motion, involves etching to remove metal mesh screen to ensure flexibility of sensing material if substrate is non-metal stretchable mesh screen.

CHEN X, LI Z, WANG M, MA Y

Chemical vapor deposition device for realizing continuous growth of graphene film on surface of graphene glass, comprises reaction unit for generating thin film on substrate by chemical vapor deposition reaction, and bearing panel.

GAO X, ZHENG K, LIU B, GU W

Forming layer, comprises e.g. exposing substrate to aromatic precursor in processing chamber, rinsing aromatic precursor from processing chamber, and heating substrate deposit graphene hard mask layer on substrate.

BHUYAN B J, LEONCINI A

Semiconductor wafer carrying structure used in organic metal chemical vapour deposition device, has protective film layer that covers surface, carrier plate that is arranged on carrier structure, and patterned coating layer that is formed on carrier plate.

LAI Y, WU J, CHEN J

Base metal flake heating device for preparing graphene by chemical vapor deposition method comprises e.g. bottom plate, top plate, and support column provided between bottom side of the top plate and the bottom plate.

LIN Y