国家/地区 美国（9） 中国（4） 欧洲专利局（EPO）（4） 日本（3） 韩国（2） 世界知识产权组织（2）
IPC部 C（10）
IPC大类 C23（10）
IPC小类 C23C（10） H01L（10） C01B（6）
B82Y（2）
IPC H01L021/02（10）
发明人 NEMANI S D（2）
公开年 2020（5） 2021（4）
申请年 2019（10）
专利权人 APPLIED MATE.（2）

Method for photon induced material deposition, involves mixing first and second solutions to form reagent on substrate, and focusing light source on reagent to form mechanically rigid deposition in focus of light source.

YANG S, XIA K, HUNG S F, CHEN Y, HONG Z

Depositing layer of carbon nanostructures on substrate by providing substrate in processing chamber, providing processing gas in processing chamber having carbon monoxide gas and creating and sustaining gaseous plasma in processing chamber.

ZAPLOTNIK R, MOZETIC M, PRIMC G, VESEL A, HORI M, ODA O

Phonovoltaic cell used as part of phonovoltaic pile of contiguous phonovoltaic cell comprises first and second conductor layer, first boron layer in contact with the first conductor layer, second boron layer in contact with the second boron layer.

CURRAN P

Method for preparing graphene wafer in batches using carrier, involves using chemical vapour deposition process to prepare graphene film on substrate, in which angle between gas flow direction and substrate is provided with specified value.

LIU Z, JIANG B, GAO X

Forming graphene layer for e.g., LEDs, by mixing carbon source with horizontally oriented molten solvent, precipitating carbon source to form graphite layer across molten solvent, and separating graphite layer into a set of graphene layers.

SUNG C, HU S C, LIN I, YU C

Forming graphene layer for improving graphene deposition, involves exposing a substrate surface comprising a dielectric material to a microwave surface-wave plasma comprising hydrocarbon and hydrogen radicals to form graphene layer.

ZHOU J, CHEN E, LIANG Q, YING C C, NEMANI S D, YIEH E Y

Method of forming graphene on substrate, involves treating surface of substrate placed in reaction chamber with plasma, and growing graphene on surface of substrate by plasma enhanced chemical vapor deposition (PECVD).

SHIN K, KIM C, YAMAMOTO K, LEE C, SONG H, LEE E, BYUN K, SHIN H, AN S, SHEN J, JIN C, SHAN B, LI C, SONG X, LI Y, BIAN Q, SHEN X, AN X, SHIN K W, LEE C S, SONG H J, BYUN K E, SHIN H J, AHN S J

Method for manufacturing multilayer graphene, involves subjecting graphene precursor to chemical vapor deposition on metal substrate containing nonmetal element, manufacturing graphene that is doped with element on metal substrate.

CHO K, YOO M S, LEE H C, CHO K W, ZHAO J, YU M, LI X

Forming electronic device i.e. 3-dimentional NAND device involves forming graphene barrier layer on substrate surface and depositing fill layer over barrier layer that prevents diffusion of elements between fill layer and substrate surface.

WU Y, GANDIKOTA S, MALLICK A B, NEMANI S D

Graphene nanoribbon precursor for use in graphene nanoribbon that is utilized in electronic device for channel of FET and resonant tunneling diode, comprises substituted terphenyl compound.

YAMAGUCHI J