国家/地区 世界知识产权组织（12）
IPC部 C（12）
IPC大类 C23（12）
IPC小类 C23C（12） H01L（6） C01B（4）
B32B（2）
IPC C23C016/30（12）
发明人
公开年 2021（3） 2022（3） 2015（2）
申请年 2020（3）  2022（2） 
专利权人

Plasma deposition of material onto two dimensional layer of first substrate, involves depositing protective layer directly onto dimensional layer by pulsed plasma deposition process, and depositing second layer onto protective layer by second plasma deposition process.

RIAZIMEHR S, KNOOPS H, SUNDARAM R

Processing substrates by providing semiconductor substrate, which comprises metal layer formed in dielectric layer and barrier layer between metal layer and dielectric layer, depositing graphene on exposed metal surface, depositing inhibitor layer and depositing dielectric material.

HAUSMANN D M, RAMNANI P G, SHARMA K, LEMAIRE P C, MAHOROWALA A P

Coated part useful as element of vehicle interior space intended to accommodate passengers comprises substrate and coating covering surface of substrate, coating comprises virucidal particles in anti-bacterial matrix.

CAVARROC M C, CHRISTINE C M

Thinning transition metal dichalcogenide in electronic device by illuminating first location of transition metal dichalcogenide material with electromagnetic radiation while applying positive potential between material and gate electrode.

ZHENG Y, HUANG S

Applying functional compound on sulfur particles for forming treated sulfur particles, involves using coating composition containing inorganic electroconductive compound, electroconductive carbon compound and organic precursor compound.

HAVERMANS D, SALLARD S, SHAFIQUE A, VANGENEUGDEN D, VANHULSEL A, HARDY A, SALAH S, SHAFIK A, VAN GENUGDEN D, HARDY N

Tribological system useful for e.g. rotor bearings in wind turbines, comprises base body and sandwich lubrication having binder-free solid lubricant layer including solid lubricant and lubricant layer with lubricant.

SCHWEIGKOFLER M, VENGUDUSAMY B, SEEMEYER S, LODERER D

Deposition of two-dimensional layer on substrate, involves feeding process gas through supply line into gas distribution chamber(s) of gas inlet containing gas outlet openings which open into process chamber, and heating substrate.

TEO K B K, MCALEESE C, CONRAN B R, MACALIZ C

Apparatus for producing transition metal dichalcogenide (TMD) transistor arrays of electronic device, has single-layer transition metal dichalcogenide formed only on substrate and lateral edges of monolayer graphene film.

PARK J, GAO H, GUIMARAES M H D, RALPH D C, KANG K, XIE S

Method for growing gallium nitride/graphene-based magnetron sputtering aluminum nitride during manufacture of device, involves transferring monolayer graphene on aluminum oxide substrate, sputtering aluminum nitride, and heat-treating.

CHEN Z, HAO Y, ZHANG J, LV J, XU S, NING J, REN Z, WANG D, LIN Z

Production of two-dimensional nanomaterial e.g. graphene used in electronic device, involves forming two-dimensional nanomaterial on liquid surface containing molten eutectic compound, of substrate by chemical vapor deposition.

BABENKO V, GROBERT N