国家/地区 韩国（5） 中国（3） 世界知识产权组织（2）
IPC部 C（9）
IPC大类 G03（9）
IPC小类 G03F（8） C01B（6） B82Y（3）
B01J（2） C23C（2） H01L（2）
IPC C01B032/194（6） G03F001/62（3） B82Y030/00（2）
B82Y040/00（2） C01B032/184（2） G03F001/22（2）
G03F007/00（2） G03F007/16（2） G03F007/32（2）
H01L021/027（2）
发明人
公开年 2022（9）
申请年 2021（9）
专利权人

Direct growth method of multilayer graphene through pressure heat treatment, comprises forming etch stop layer, forming metal catalyst layer, forming amorphous carbon layer and directly growing multilayer graphene on seed layer.

KIM H, KIM S K, MI K H, YOO C S, JOJINWOO, KIM H Y, JEONJUNHYUCK, YUNSUNGHO, SUNG K H, LEE S M

Manufacturing graphene wrinkles using three-dimensional structure patterning process comprises etching transition metal thin film to form three-dimensional pattern and inserting into chemical vapor deposition chamber to synthesize graphene.

KIM J, WIMALANANDA M D S, LEE J M

Patterning method for manufacturing of a desired pattern of an electrically conducting, semiconducting or insulating material on a substrate,.

LEPPAENIEMI J, SNECK A

Adhesive composition for reticle assembly, comprises a polyphenol compound including tannic acid, a polymer including polyvinyl alcohol and a solvent including water and alcohol.

LEE Y, JEONG C Y, LEE H, YOO B, KIM M J, KIM M, RYU B C, LEE H S, YOUNG J C, DING C, LI H, LIU B

Producing nanosheet, used to produce reduced graphene oxide sheet, comprises e.g. spin-coating sheet with graphene oxide solution, setting area, and contacting basic material to patterning surface of patterned poly dimethylsiloxane stamp.

LEE J H

Method for preparing micro-nano composite of graphene quantum dot array, involves removing mask glue, annealing to remove residual glue, and etching to remove surface sacrificial layer to obtain final graphene array structure.

ZHAO Q, YANG Z, CHEN R, PENG F, YAN Z, CHANG Z, HUANG X

Removing polymethylmethacrylate (PMMA) from graphene surface by subjecting PMMA layer to deep UV light irradiation, treating irradiated PMMA layer to remove PMMA layer and drying cleaned layer located on substrate in stream of nitrogen gas.

ALEXEEVA N, KASALYNAS I

Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.

CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W

Metal screen coating with high gain and large scattering angle comprises screen coating provided with numerous sound-transmitting holes, wear-resistant layer, protective layer, flexible stretch film, metal layer, protective transition layer, screen substrate layer, and anti-vibration layer.

CHEN Z, LV S