国家/地区 英国（21）
IPC部 C（21）
IPC大类 C01（21）
IPC小类 C01B（21）
IPC C23C016/26（20） C01B032/186（17） C01B031/04（11）
B82Y030/00（8） B82Y040/00（8） C23C016/02（8）
C30B025/18（6） C01B032/182（5） C23C016/56（5）
H01L021/02（5） B32B009/00（4） C30B029/02（4）
C01B031/02（3） C01B032/184（3） C01B032/194（3）
发明人 GUINEY I（7） THOMAS S（6） DIXON S（5）
COLOSIMO N G R（3） GRIFFIN R M（3） BADCOCK T J（2）
BOINTON T H（2） CRACIUN M（2） GLASS H（2）
RUSSO S（2） TYLER M（2） WALLIS R（2）
公开年 2013（4） 2016（4） 2021（4） 2022（4） 2015（2）
申请年 2013（3）  2014（3）  2015（3）  2020（3）  2022（3）  2012（2）  2021（2） 
专利权人 PARAGRAF LTD（7） BAE SYSTEMS .（3） INT BUSINESS.（2） UNIV EXETER（2）

Growing graphene layer structure on substrate used in opto-electronic device, e.g., solar cell, solar cell, light-emitting diode, organic light-emitting diode, electro-optic modulator, photodetector or diode, involves providing substrate on susceptor in chemical vapor deposition reaction chamber.

THOMAS S, GUINEY I, DIXON S

Forming graphene layer structure, comprises providing growth substrate having growth surface, and forming graphene layer on growth surface by chemical vapor deposition, where growth surface is formed of material e.g. yttrium-stabilized zirconia.

DIXON S, GUINEY I, THOMAS S, GRIFFIN R M, BADCOCK T J

Wafer used to chemical vapor deposition growth of uniform graphene comprises planar silicon substrate, insulating layer provided across silicon substrate, and barrier layer provided across the insulating layer.

DIXON S, KAINTH J, JAGT R, GUINEY I, BADCOCK T J

Forming a graphene layer structure used in Hall effect sensor, involves providing growth substrate having growth surface, and forming graphene layer structure on growth surface by chemical vapor deposition method, where growth surface is formed of material consisting of e.g. magnesium aluminate.

GRIFFIN R M, THOMAS S, GUINEY I, DIXON S

Producing graphene useful for electronic devices comprises forming graphene on non-metallic surface of substrate by chemical vapor deposition in reaction chamber and adding precursor in gas phase and suspended in gas into reaction chamber.

DIXON S, GRIFFITHS J, GRIFFIN R M, GUINEY I, THOMAS S

Manufacturing first sheet of first two-dimensional material i.e. graphene, comprises e.g. providing container containing substrate, comprising set of layers having solid layer and volume above substrate and supplying precursor species.

COLOSIMO N G R

Making first sheet of first two-dimensional material has providing container containing substrate comprising set of layers including first liquid layer and solid layer above it, supplying precursor species, allowing precursor species to settle on surface of substrate and liquefying solid layer.

COLOSIMO N G R

Producing polymer-coated graphene layer structure involves e.g. adding substrate to reaction chamber, supplying flow comprising precursor compound to form graphene layer structure, heating and spin-coating using polymer or polymer precursor.

GLASS H, GUINEY I, TYLER M, WALLIS R, THOMAS S, TAYLOR M

Production of electronic device such as integrated circuit board, involves providing substrate, supplying flow comprising precursor compound, selectively laser ablating graphene, and selectively laser ablating surface of substrate.

GLASS H, GUINEY I, TYLER M, WALLIS R, BAINES R, THOMAS S

Synthesizing graphene involves annealing substrate in hydrogen gas atmosphere, subsequently undertaking deposition and nucleation step where relatively thick carbon layer is deposited onto substrate, and undertaking graphene growth step.

BOINTON T H, BARNES M D, RUSSO S, CRACIUN M, HARDISTY BOINTON T