国家/地区 中国（14）
IPC部 B（14）
IPC大类 C01（14）
IPC小类 C01B（14）
IPC G03F007/20（8） B82Y040/00（7） C01B031/04（6）
C01B032/194（6） C01B031/02（5） C01B032/186（4）
G03F001/62（4） B82Y030/00（3） B01D067/00（2）
B32B009/00（2） B32B009/04（2） B32B033/00（2）
B44C001/22（2） C01B032/05（2） C01B032/184（2）
发明人 SUNG C（3） LEE E（2） LI Y（2）
SONG J（2） YOON J（2）
公开年 2013（3） 2016（2） 2022（2）
申请年 2012（2）  2013（2）  2016（2）  2021（2） 
专利权人 SUNG C（3）

Method for preparing graphene sub-nanoscale gap by feedback control electric breakdown, involves stopping voltage to apply to two ends of single-layer graphene nanoribbon when resistance of single-layer graphene nanoribbon reaches preset resistance to construct and obtain graphene sub-nanoscale gap.

SU M, HONG W, LIU J, ZHANG C, YUAN Z

Nanocrystalline graphene used for complementary metal-oxide-semiconductor process, comprises grains in stack of graphene sheets.

KIM S, BYUN K, CHO Y, SHIN K, LEE E, LEE C, SONG H, SHIN H, YOON J, LEE S, LIM H, BYUN K E, CHO Y C, SHIN K W, LEE C S, SONG H J, SHIN H J, SU Y J, LEE S Y, LIM H S, LI Z, YOUN J, SHEN X, LI C, LI Y, ZHAO L, JIN S

Method for preparing micro-nano composite of graphene quantum dot array, involves removing mask glue, annealing to remove residual glue, and etching to remove surface sacrificial layer to obtain final graphene array structure.

ZHAO Q, YANG Z, CHEN R, PENG F, YAN Z, CHANG Z, HUANG X

Pellicle film used for preventing dust from adhering to photomask or reticle, comprises layers laminated to each other and/or layers provided with one or more openings.

TAKADA N, SEKI K, KODERA Y, SEKIGAZUNORI, YUTAKA G

Manufacturing graphene film used for manufacturing pellicle involves coating graphene with protective film, removing base material by wet etching with etching liquid and dissolving protective film using solvent having lower surface tension.

YANASE Y, YANASE M, LIANG L

Method for manufacturing pellicle for lithographic apparatus involves removing first substrate portion to form freestanding membrane from graphene layer, in which freestanding membrane is supported by second substrate portion.

PETER M, ABEGG E A, GIESBERS A J, KLOOTWIJK J H, NASALEVICH M A, VAN DEN EINDEN W T, VAN DER ZANDE W J, VAN ZWOL P, VERMEULEN J P M, VLES D F, VOORTHUIJZEN W, GIESBERS A J M, VAN ZWOL P J, VOORTHUIJZEN W P, VAN DEN EINDEN W T A J, VERMEULEN J P M B

Preparing nanoscale graphene structure involves selecting substrate and growing graphene on substrate, depositing chromium film on graphene, etching graphene using ion beam etching technology, removing metallic film to obtain pure nanoscale.

GU C, LI J, QUAN B, YANG H, TANG C, ZHANG H

Manufacture of molded filter material involves forming support layer on graphene layer formed on initial stage substrate for graphene, forming water passage hole in support layer, and forming water passage hole in graphene layer.

KANEKO K, TAKAGI T, MURATA K, MURADA K, TAKAGE T, TAKAGI H

Manufacturing graphene film involves preparing catalyst metal having at least surface on which graphene is formed, forming support layer on graphene, and isolating graphene and support layer from catalyst metal.

NA D, LEE E, YOON J, NA D H, LEE E K, YOON J H, LI Y

Structure useful to shield electromagnetic disorders for shielding electromagnetic radiation, comprises thin layer of graphene and flexible substrate, in which thin layer of graphene is applied on flexible substrate and is doped with dopant.

AVOURIS P, GARCIA A V, SUNG C, XIA F, YAN H