国家/地区 日本（19）
IPC部 C（19）
IPC大类 C23（19）
IPC小类 C23C（19） C01B（18） H01L（8）
B82Y（7） B32B（5） H01B（3）
B01J（2） C30B（2） H05K（2）
IPC C23C016/26（19）
发明人 SATO M（2）
公开年 2013（12） 2012（5） 2014（2）
申请年 2012（19）
专利权人 DOKURITSU GY.（3） FUJITSU LTD（2） TOSHIBA KK（2） ULVAC INC（2）

Method of growing graphene for electronic device involves forming metal film on single crystal silicon, reacting single crystal silicon and part of metal film, and epitaxially growing metal silicide film on single crystal silicon.

HAYASHI K

Apparatus for manufacturing graphene film used for e.g. transparent electrode, has system for supplying film-forming material gas containing carbon, stage and counter electrodes, and device for applying direct current pulse voltage.

TSUKAHARA N

Manufacture of graphene film used for e.g. gas barrier film, involves depositing graphene film on base material surface maintained at specified temperature and pressure by microwave surface wave plasma chemical vapor deposition method.

TSUGAWA K, YAMADA T, HASEGAWA M

Formation of graphene film used for e.g. electronic device, involves performing reduction process by heating metal film in atmosphere containing hydrogen gas, carrying out graphene film growth process, and cooling.

YOSHII S, NOZAWA K, MATSUKAWA N

Preparation of graphene paper involves introducing protective gas into reaction chamber having clean substrate, heating substrate, continuously introducing carbonaceous material and cooling to obtain graphene paper on substrate surface.

WANG Y, YUAN X, ZHOU M

Formation method for transparent conductive film, involves forming transparent conductive film comprising sheet-like graphene, by sintering coated graphene ink to base-material surface at predetermined temperature.

TAKEI H, SAKIO S, SATO M, HIRAOKA K, IKEDA S, SAKAO Y, OTAKE F

Manufacturing method of semiconductor device, involves forming graphene layer on catalyst layer after planarizing exposed surface of catalyst layer by oxidation-treating.

YAMAZAKI Y, KATAGIRI M, SAKAI T, SAKUMA H, KITAMURA M, SAKATA A, WADA M, KAJITA A, MIZUSHIMA I, SAKUMA N

Manufacture of graphene-like substance for electronic device involves heating substrate, introducing gas containing hydrocarbon, and forming graphene-like substance on substrate by plasma chemical vapor deposition method.

SUGITA H, KISHI N, SOGA T, JIMBO T

Manufacturing electrical conductor, comprises providing substrate layer, depositing surface layer on substrate layer, and depositing graphene layer on substrate layer.

SULLIVAN M M E, HILTY R D, MARTENS R I, ZHENG M, HEMOND J H B, LIU Z, SULLIVAN MALERVY M E, SULLIVAN MALERVY M, HILTY R, MARTENS R, HEMOND J, SULLIVANMALERVY M E

Pre-processing method of catalyst metal layer during formation of graphene, involves activating catalyst metal layer by applying plasma of process gas containing reducible gas and nitrogen-containing gas to catalyst metal layer.

MATSUMOTO TAKASHI, MATSUMOTO T