国家/地区 美国（25）
IPC部 C（25）
IPC大类 C23（25） H01（13） C01（12）
B82（7） B05（3） C10（3）
B01（2） B32（2） C30（2）
F16（2）
IPC小类 C23C（25） C01B（10） H01L（8）
B82Y（7） B05D（3） C01G（3）
C10M（3） H01B（3） H01M（3）
B01J（2） B32B（2） B82B（2）
C30B（2） F16C（2）
IPC C23C016/40（25）
发明人 BERMAN D（3） CHOI J（3） EDDY C R（3）
ERDEMIR A（3） GARCES N（3） GASKILL D K（3）
JERNIGAN G G（3） SUMANT A V（3） WHEELER V D（3）
LEE C（2） LEE C S（2） MASCHMANN M R（2）
SHIN K（2） YOUNG M J（2）
公开年 2021（8） 2022（4） 2014（3） 2013（2） 2015（2） 2018（2） 2023（2）
申请年 2021（9）  2013（2）  2014（2）  2015（2）  2018（2）  2020（2）  2022（2） 
专利权人 UCHICAGO ARG.（3） US SEC OF NA.（3） SAMSUNG ELEC.（2） UNIV MISSOUR.（2）

Depositing nanoscale-thin film in preselected area on substrate for area-selective atomic layer deposition based on electron beam patterning of chemical functional groups, involves depositing layer of functionalizing molecule onto or adjacent to first surface of substrate.

YOUNG M J, MASCHMANN M R

Graphene interconnect structure useful for electronic device comprises first oxide dielectric layer including porous silicon oxide, or amorphous boron nitride, second oxide dielectric layer including aluminum oxide and graphene layer.

KIM C, BYUN K E, SHIN K W, LEE C S, BAEKWON P, PARK B, LEE C, SHIN K, BYUN K

-Product comprises solid state electrolyte particle coated with a coating consisting essentially of metal oxide, and prepared by depositing a coating on a solid state electrolyte particle by atomic layer deposition.

WOOD M, MILLER J, ESPITIA J A, YE J

Forming carbon-based foam with silica particles doped with boron-10 aluminum oxide (B10-Al-O) mixed in its, comprises e.g. depositing B10-Al-O compound using atomic layer deposition on silica particles in open mesh basket in vacuum chamber.

DWIVEDI V

Preparing thin free-standing oxide film as supports of metal particles for catalysis studies, as electrodes in electrocatalysis, in batteries, and in many other applications, involves providing substrate, depositing layer of metal on substrate, depositing supporting layer on layer of metal.

SANCHEZ C M, SALMERON M, SCHWARTZBERG A, VAN SPRONSEN M, ZHAO X, LU Y

Depositing nanoscale-thin film in preselected area on substrate, involves depositing layer of functionalizing molecule onto or adjacent to surface of substrate, and functionalizing surface of substrate by focusing source of ionizing radiation onto layer of functionalizing molecule.

YOUNG M J, MASCHMANN M R

Structure e.g. porous metal-coated structure used for e.g. catalytic application, comprises substrate comprising activated adsorbent material, and metal material deposited on substrate.

PEPIN P, ETHRIDGE K, THOMSON C, HOLBROOK B, ESRIDGE K

Vapor deposition process for selectively depositing material on a first surface of substrate relative to a second organic surface for semiconductor device, comprises contacting the substrate cyclically with a vapor phase hydrophobic first reactant and a vapor phase second reactant.

TOIS E, HAUKKA S P, NISKANEN A, MATERO R H, SUEMORI H, FAERM E

Method for production of atomic bilayer nanotape, involves oxidizing portion of monolayer to provide oxidized portion, and removing oxidized portion to provide atomic layer nanotape comprising transition metal dichalcogenide material.

HARUTYUNYAN A R, LI X

Anti-fouling coating for use in e.g. optical instrument, has coating layer formed on substrate, where coating layer is made of indium tin oxide, and dielectric layer formed between coating layer and substrate.

WILKEN R, SPECHT U, LUKASCZYK T