国家/地区 美国（24） 韩国（23） 中国（7） 日本（5） 欧洲专利局（EPO）（4）
IPC部 H（24） B（11） C（9）
G（2）
IPC大类 H01（24） B82（9） C01（8）
C23（3） B01（2） B32（2）
IPC小类 H01L（22） B82Y（9） C01B（8）
C23C（3） H01B（3） B32B（2）
IPC H01L029/16（13） H01L029/78（13） H01L029/66（10）
H01L029/786（10） H01L021/336（8） C01B031/02（7）
H01L029/06（7） C01B031/04（5） H01L029/08（5）
B82Y010/00（4） B82Y040/00（4） H01L029/778（4）
H01L051/05（4） B82Y030/00（3） B82Y099/00（3）
发明人 SEO D（26）
公开年 2014（9） 2013（7） 2011（6） 2015（2）
申请年 2013（11）  2010（4）  2012（3）  2011（2）  2014（2） 
专利权人 SAMSUNG ELEC.（23） SEO D（6） BYUN K（3） CHUNG H（3）
HEO J（3） PARK S（3） SNU R DB FO.（3） SONG H（3）
UNIV SEOUL N.（3） KIM H（2） LEE J（2）

Method for producing carbon material in electrolytic cell, involves removing ions at liquid cathode to yield carbon material, where carbon material is removed from cell by settling or floating by gravity or filtering.

SEO D

Manufacturing display apparatus involves preparing support substrate, forming metal oxide layer on surface of support substrate, metal oxide layer comprises first charges, and forming debonding layer on surface of metal oxide layer.

SIM J, SHIN H, KIM H, SEO D, XU D, SHEN X, SHEN J, SUH D, KIM H S, SHIM J H

Method for fabricating field effect transistor, involves filling slit with potential barrier material is provided to induce Fowler-Nordheim tunneling through graphene channel layer when gate voltage is applied to gate electrode.

LEE J, PARK S, BYUN K, SEO D, SONG H, SHIN H, CHUNG H, HEO J

Graphene device, includes gate electrode layer which is formed on gate insulation layer and third electrode layer formed on second portion of graphene layer.

SEO D, KIM H J, YOO I K, LEE M J, CHO S H, KIM H, YOO I, LEE M, CHO S

Graphene device has insulating layer which is provided between graphene layer and gate electrode, and semiconductor substrate is provided with tunable Schottky barrier formed by junction of source electrode, graphene layer and substrate.

CHUNG H, SEO D, PARK S, BYUN K, SONG H, YANG H, HEO J, CHUNG H J, PARK S J, BYUN K E, SONG H J, YANG H J, HEO J S

Graphene memory has Schottky barrier that is formed between conductive semiconductor substrate and graphene layer such that graphene layer is used as charge-trap layer for storing charges.

LEE J, CHUNG H, PARK S, BYUN K, SEO D, SONG H, HEO J, LEE J H, CHUNG H J, PARK S J, BYUN K E, SONG H J, HEO J S, HUH J, JUNG H, SONG C, SAIL D

Graphene device used for electronic apparatus e.g. semiconductor device, consists of active layer, graphene layer, and electrode spaced apart from graphene layer and controls work function of graphene layer based on applied voltage.

SHIN H, BYUN K, SONG H, PARK S, SEO D, WOO Y, LEE D, LEE J, CHUNG H, HEO J, YOO I, SHIN H J, BYUN K E, SONG H J, PARK S J, WOO Y S, LEE D W, LEE J H, CHUNG H J, HEO J S, YOO I K, JIN S H, EUN B G, JAE S H, JUN P S, SEOK S H, SEONG W Y, GYEONG Y I, UK L D, HO L J, JONG J H, SEONG H J, HUI D, HUH J, YEO R, JUNG H

Electronic device e.g. field effect transistor (FET) has graphene that directly contacts area of semiconductor layer, and metal layer on graphene.

BYUN K, PARK S, SEO D, SONG H, LEE J, CHUNG H, HEO J, BYUN K E, PARK S J, SONG H J, LEE J H, CHUNG H J, HEO J S

Manufacture of graphene for fabricating electronic device and display device, involves forming silicon carbide thin film on substrate, forming metal thin film on silicon carbide thin film, and heating to obtain metal composite layer.

LEE D W, SHIN H, PARK S, BYUN K, SEO D, SONG H, WOO Y, LEE J, CHUNG H, HEO J, SHIN H J, PARK S J, BYUN K E, SONG H J, WOO Y S, LEE J H, CHUNG H J, HEO J S

Graphene switching device for use as diode has gate electrode which is provided on gate insulation layer arranged on graphene layer set on insulation layer.

LEE J, PARK S, BYUN K, SEO D, SONG H, SHIN H, CHUNG H, HEO J, LEE J H, PARK S J, BYUN K E, SONG H J, SHIN H C, CHUNG H J, HEO J S