国家/地区 韩国（29）
IPC部 B（29）
IPC大类 C01（29）
IPC小类 C01B（29）
IPC C01B031/02（28） C23C016/26（19） B82Y040/00（16）
B82Y030/00（12） C01B031/04（12） H01B001/04（8）
B01J019/08（6） B82B003/00（5） C01B032/186（5）
B32B009/00（4） C23C016/56（4） B32B037/00（3）
B32B043/00（3） C23C016/46（3） B01J019/18（2）
发明人 HONG B H（5） CHOI I S（3） CHOI J（3）
HONG B（3） KIM H（3） LEE K J（3）
WON D K（3） YOO J B（3） AHN J（2）
AHN J H（2） CHIBA G（2） CHIBA Y（2）
CHOE P（2） CHOI B（2） CHOI B L（2）
公开年 2012（29）
申请年 2012（14）  2011（13）  2010（2） 
专利权人 HANWHA TECHW.（7） SAMSUNG TECH.（7） KOREA ADV IN.（5） UNIV SUNGKYU.（5）
SAMSUNG ELEC.（4） UNIV SUNGKYU.（4） UNIV SUNGKYU.（3） GRAPHENE SQU.（2）
HANWHA AEROS.（2） JX NIPPON MI.（2） KOREA ADVANC.（2） NIPPON MININ.（2）
NIPPON MININ.（2） UNIV SUNGKYU.（2）

Structure, useful in e.g. a graphene device e.g. a transistor, comprises a substrate, a growth layer, a graphene layer, and a protective layer, where the growth layer is disposed on the substrate and has a groove.

CHOI B, LEE E, WHANG D, CHOI B L, LEE E K, WHANG D M, CHOE P, HWANG T

Method for non-destructively transferring graphene, involves nondestructively combining graphene coated with media with target substrate, and removing media to transfer graphene to target substrate nondestructively.

REN W, GAO L, MA L, CHENG H

Copper foil for manufacturing graphene, has specified sum total of oxides and sulfides having diameter of below preset value before heating under hydrogen and argon-containing atmosphere.

CHIBA Y, YAMAJI T, YOSHIHIRO C, TATSUYA Y, CHIBA G

Method for forming graphene pattern using exfoliation technique, involves selectively peeling graphene layer by polymer stamp, and forming raised pattern on rotator polymer stamp, where polymer stamp is made of polydimethylsiloxane.

AN K, CHUNG T, JUNG D, KIM C G, KIM H S, LEE S S, LEE Y K, AN K S, CHUNG T M, LEE S, LI Y, KIM C, KIM H

Manufacture of graphene for e.g. touch screen, involves loading substrate having catalyst layer into chamber, evaporating, supplying carbon source gas, heating in primary portion of catalyst layer, dissolving carbon component, and cooling.

JEON S, LEE J, OH S, RAN O S, SEOP L J, U JEON S, JIN S L, SE R O, SEOK W J

Making crystalline graphene, used e.g. in electronic device, comprises e.g. performing first thermal treatment by supplying heat to inorganic substrate, and introducing vapor carbon supply source into reactor during first thermal treatment.

SHIN H, CHOI J, WOO Y, YOON S, SHIN H J, CHOI J Y, WOO Y S, YOON S M

Forming multi-layer graphene involves forming stack of graphitizing metal catalyst layer and graphene by repeatedly forming the catalyst layer on substrate, and forming graphene on the catalyst layer; and removing the metal catalyst layer.

WOO Y, CHOI J, CHOI W, SHIN H, YOON S, WOO Y S, CHOI J Y, CHOI W M, SHIN H J, YOON S M

Graphene manufacturing device has heating portion anneals processed substrate in which amorphous carbon is deposited.

GWAN W D, YEONG K N, WON D K, KIM N Y

Manufacture of graphene film used for e.g. transparent display, involves forming graphene on catalyst metal film, forming another film on surface of graphene, on which catalyst metal film is not formed, and removing catalyst metal film.

SONG Y, SONG Y I

Graphene synthesis chamber for synthesizing graphene comprises chamber case in which substrate comprising metal thin film, gas supply unit, main heating unit which emits light to inner space to heat substrate; and auxiliary heating unit.

WON D, NAM W, WON D K, NAM W S