国家/地区 世界知识产权组织（15）
IPC部 C（15） H（10） B（4）
G（4）
IPC大类 C01（15）
IPC小类 C01B（15）
IPC C01B032/186（9） C23C016/26（9） C23C016/02（5）
B82Y040/00（4） C01B032/182（4） C01B032/184（4）
B82Y030/00（3） C23C014/06（3） C23C016/56（3）
H01L021/02（3） H01L021/205（3） C01B032/15（2）
C23C016/40（2） C23C016/455（2） C23C016/50（2）
发明人 IFUKU R（3） MATSUMOTO T（3） WADA M（3）
BADCOCK T J（2） DIXON S（2） GUINEY I（2）
KABUKI N（2） NAVEH D（2） NAVEH D Y（2）
YAMADA H（2）
公开年 2022（11） 2023（4）
申请年 2022（15）
专利权人 TOKYO ELECTR.（4） UNIV BARILAN（4） 2D GENERATIO.（2） PARAGRAF LTD（2）

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Coating metal surface with graphene used in organic LED by depositing first graphene molecular precursor on top of metal surface and transforming deposited first graphene molecular precursor into surface bound graphene interfacial layer.

NAVEH D Y

Producing coated nano-ordered carbon particles used in anode within rechargeable battery including sodium-ion batteries and other metal-ion batteries, involve exposing carbon-containing material to expanding agent to produce expanded carbonaceous particles during expanding process.

ENTERKIN J A, WORFOLK B J, ZHANG L

Method for coating non-metallic surface for semiconductor device, involves obtaining graphene molecular precursor comprising substituted hydrocarbyl compound, depositing precursor on non-metal surface, reacting to form covalent bonds, and transforming deposited precursor into surface.

NAVEH D Y

Film forming method by loading substrate into processing container, forming graphene film on substrate with plasma of process gas comprising carbon-containing gas, forming doped graphene film on substrate and/or graphene film with plasma of process gas comprising dopant gas.

YAMADA H, IFUKU R, MATSUMOTO T, KABUKI N

Digital formation of two-dimensional materials structures used for electronic components, involves generating donor substrates containing back surface and front surface, applying coating to front surface, and irradiating coating containing donor material.

ZERGIOTI I, PAPAZOGLOU S, ZACHARATOS F, LOGOTHETI A, PESQUERA A, ZURUTUZA A, NAVEH D

Repairing layers of laminate stack or printed circuit board, comprises providing layered structure, identifying fault location in outer graphene layer, preparing surface of outer graphene layer, and applying localized heat on fault location.

MENTOVICH E, ATIAS B, NAVEH D, LEVI A, SMOLINSKY E Z B

Substrate processing includes taking substrate into processing vessel, removing oxygen-containing layer on substrate using plasma of gas mixture including hydrogen-containing gas, and forming nucleation layer and graphene film on substrate using plasma of gas mixture including carbon-containing gas.

IFUKU R, MATSUMOTO T, WADA M, KABUKI N

Transferring molecular material to surface involves contacting substrate with solution-synthesized polymer precursors, removing bulk pyrene matrix, and surface-assisted cyclodehydrogenation.

CROMMIE M F, FISCHER F R, BOKOR J, JACOBSE P H, MUTLU Z, MCCURDY R D, VEBER G C, RIZZO D J

Forming graphene layer structure, comprises providing growth substrate having growth surface, and forming graphene layer on growth surface by chemical vapor deposition, where growth surface is formed of material e.g. yttrium-stabilized zirconia.

DIXON S, GUINEY I, THOMAS S, GRIFFIN R M, BADCOCK T J