国家/地区 美国（22） 世界知识产权组织（11） 韩国（10） 台湾（9） 中国（6） 日本（6） 德国（2） 新加坡（2）
IPC部 C（27）
IPC大类 C01（27） H01（27） C23（14）
B01（7） B82（5） H05（4）
C08（3） B05（2） B32（2）
C30（2）
IPC小类 C01B（27）
IPC H01J037/32（27）
发明人 ANZELMO B H（6） STOWELL M W（6） COOK D（5）
TANNER D（3） BALDWIN J（2） GHEZELBASH H（2）
HINES M（2） IFUKU R（2） KC C B（2）
LANNING B（2） MATSUMOTO T（2） ROGOJINA E（2）
SINGH S（2）
公开年 2021（6） 2022（5） 2018（3） 2023（3） 2015（2） 2016（2） 2017（2）
申请年 2020（6）  2021（5）  2013（3）  2022（3）  2015（2）  2016（2）  2018（2） 
专利权人 LYTEN INC（6） APPLIED MATE.（3） TOKYO ELECTR.（3）

Graphene processing device for providing low energy injection ion for use in e.g. biological medicine application, has upper electrode net and the lower electrode net through which plasma generated by plasma coil discharge passes so as to process sample located on sample seat in processing chamber.

WANG W, JIANG C, WANG Y, WANG H

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Device for producing graphene layer, has one electrode which is connected to positive pole of voltage source, and other electrode that is connected to negative pole and is provided for carbon ions accumulate in graphene attachment region so as to form graphene layer.

KREISCHER U

Upper electrode assembly used in plasma processing apparatus, has heat transfer sheet that is mounted between electrode plate and metal plate and having vertically oriented portion with vertically oriented graphene structures.

TSUJIMOTO H, KOBUNE T, LI L, LEE L, KOBUNEDAKAKI

Producing photoluminescence material involves placing plastic piece into working solution which is water, applying micro-plasma onto surface of the working solution, and degrading the plastic piece into multiple smaller molecular and graphene quantum dot.

CHIANG W, WENG R, WENG R J

Composite material used for functionalizing carbon structures within plasma reactor, or liquid collection facility, comprises polymer, and graphene-containing material, where composite material has glass transition temperature that is 10% greater than glass transition temperature of polymer.

KC C B, BALDWIN J, HINES M, VANHEUSDEN K, ROGOJINA E, COOK D, LANNING B, ANZELMO B H, STOWELL M W

Depositing graphene layer on substrate in plasma enhanced chemical vapor deposition of graphene at low temperatures, involves providing substrate within modular microwave plasma chamber, and flowing carbon source and hydrogen source into modular microwave plasma chamber.

KRAUS P A, NGUYEN H, MEBARKI B, WANG C, VALENCIA C, CHUA T C

Processing semiconductor by generating plasma of carbon- and hydrogen-containing precursors, forming layer of graphene on substrate, and halting flow of carbon-containing precursor while maintaining plasma with hydrogen-containing precursor.

INGLE N K, MALLICK A B, SINGHA R S, WANG J, ROY S S

Forming layer, comprises e.g. exposing substrate to aromatic precursor in processing chamber, rinsing aromatic precursor from processing chamber, and heating substrate deposit graphene hard mask layer on substrate.

BHUYAN B J, LEONCINI A

Film forming by cleaning interior of treatment container, extracting and removing oxygen inside treatment container, introducing substrate into treatment container, and forming carbon film on substrate by plasma chemical vapor deposition.

MAKOTO W, TAKASHI M, NOBUTAKE K, RYOTA I, MASAHITO S, HIROKAZU U, MATSUMOTO T, KABURAGI N, IFUKU R, SUGIURA M, UEDA H, WADA M, KABUKI N