国家/地区 美国（11） 韩国（6） 中国（5） 世界知识产权组织（4） 台湾（3）
IPC部 C（16）
IPC大类 C01（16） H01（16） C23（9）
B01（2） B82（2） C30（2）
H05（2）
IPC小类 C01B（16）
IPC H01L021/02（16）
发明人 SHIN K（2） SHIN K W（2）
公开年 2023（10） 2022（6）
申请年 2022（16）
专利权人 SAMSUNG ELEC.（3） TAIWAN SEMIC.（2）

Hard mask film used in etching process for manufacturing semiconductor device, comprises first graphene layer, first amorphous carbon layer on first graphene layer, second graphene layer on first amorphous carbon layer, and second amorphous carbon layer on second graphene layer.

KIM Y, OH S, AN S, AHN S J, OH S R, KIM Y U, AN X

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Manufacture of thin film used for field effect transistor, involves providing graphene layer on one surface of substrate, functionalizing other surface opposite to one surface of substrate using reactant, depositing thin film on functionalized graphene layer, and separating thin film by heating.

LEE G H, RYU H J, RYU H

Interconnect structure for electronic device, comprises first dielectric layer including trench, conductive wire filling inside of trench, first cap layer on top surface of conductive wire, first cap layer including doped graphene, and doped graphene being graphene doped with group fifth element.

JUNG A, KIM S, SHIN K, SHIN K W, KIM S T, JUNG A R

Graphene interconnect structure useful for electronic device comprises first oxide dielectric layer including porous silicon oxide, or amorphous boron nitride, second oxide dielectric layer including aluminum oxide and graphene layer.

KIM C, BYUN K E, SHIN K W, LEE C S, BAEKWON P, PARK B, LEE C, SHIN K, BYUN K

Improving quality of metal catalytic thin layer prepared by sputtering comprises cleaning Si/SiO2 substrate, photoetching the pattern, sputtering a layer of metal thin layer with the graphene of catalyzing and growing on the substrate sheet by using the sputtering table, peeling and etching.

ZHAO Y, YU X, LIU Z, NIE X, SONG Z, DENG J, HE X

Film forming method involves loading substrate into processing container, forming interface layer having amorphous structure or microcrystalline structure on substrate by plasma of first mixed gas including carbon-containing gas and forming graphene film on interface layer.

NAKAMURA G, TERADA H, MATSUMOTO T, KABUKI N, WADA M, IFUKU R, NAKAMURA K, KAMURAGI N

Processing semiconductor for producing high quality devices and structures, involves delivering carbon-containing precursor and hydrogen-containing precursor to processing region of semiconductor processing chamber, forming layer of graphene on substrate positioned in processing region of chamber.

INGLE N K, MALLICK A B, SINGHA R S, WANG J

Patterned graphene film for use in electronics and mechanics, has patterned substrate comprising patterned fine-grained metal or alloy layer with multiple discrete regions which structure of metal is selectively changed to amorphous.

ZAKAR E S

Synthesizing self-assembled mixed-dimensional heterostructure used in composition, involves depositing boron on substrate to grow borophene on it at substrate temperature in ultrahigh vacuum chamber, depositing orderly 4,4-dibromo-p-terphenyl on borophene grown substrate at room temperature.

AKLILE E B, LIU X, LI Q, HERSAM M C