国家/地区 美国（9） 中国（7） 韩国（7） 日本（6） 世界知识产权组织（6） 台湾（4） 新加坡（3） 欧洲专利局（EPO）（2）
IPC部 C（12）
IPC大类 C01（12） H01（12） C23（8）
B01（3） B82（2） G01（2）
H05（2）
IPC小类 C01B（12）
IPC C01B032/186（12）
发明人 LI Z（2）
公开年 2021（3） 2023（2）
申请年 2020（3）  2017（2）  2021（2）  2022（2） 
专利权人 APPLIED MATE.（2）

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Preparation method of graphene-based composite material involves using mixed gas of argon gas and hydrogen as carrier gas, and obtaining graphene-based composite material by chemical vapor deposition, where graphene material grows parallel to substrate in composite material.

WEI M, CHEN L, GUO X, ZHAO Y, LI X, ZENG F, TANG S, TANG Z

Depositing graphene layer on substrate in plasma enhanced chemical vapor deposition of graphene at low temperatures, involves providing substrate within modular microwave plasma chamber, and flowing carbon source and hydrogen source into modular microwave plasma chamber.

KRAUS P A, NGUYEN H, MEBARKI B, WANG C, VALENCIA C, CHUA T C

Forming layer, comprises e.g. exposing substrate to aromatic precursor in processing chamber, rinsing aromatic precursor from processing chamber, and heating substrate deposit graphene hard mask layer on substrate.

BHUYAN B J, LEONCINI A

Film forming by cleaning interior of treatment container, extracting and removing oxygen inside treatment container, introducing substrate into treatment container, and forming carbon film on substrate by plasma chemical vapor deposition.

MAKOTO W, TAKASHI M, NOBUTAKE K, RYOTA I, MASAHITO S, HIROKAZU U, MATSUMOTO T, KABURAGI N, IFUKU R, SUGIURA M, UEDA H, WADA M, KABUKI N

Depositing graphene on a metal surface of substrate by providing substrate including metal surface in reaction chamber, flowing hydrocarbon precursors into reaction chamber and toward the substrate, and generating radicals of hydrogen.

VARADARAJAN B N, NARKEVICIUTE I

Surface multi-fold nitrogen-doped tubular graphene used for field emission cathode material which has tubular structure and specified quantity range of pipe diameter and is formed by staggered stacking of nitrogen-doped graphene sheets.

SONG G, LI Z, ZHANG J, LUO S, MENG A

Porous silicon composite clusters used in carbon composite for electrode, comprise porous core comprising silicon secondary particles comprising aggregates of silicon primary particles comprising silicon, silicon oxide and graphene.

SON I, LEE J, PARK S, HAN S, SON I H, LEE J M, PARK S Y, LEE J H, HAN S S, LI Z

Graphene deposition process for deposition of graphene on substrates, involves generating radio frequency plasma at location proximate to substrate, while flowing precursor gas containing carbon through plasma and over substrate.

CHEN Z, CHUGH S, MEHTA R

Graphene film manufacturing device comprises wrinkles flattening device, base substrate, graphene film, porous adsorption member, hollow space and vacuum suction port.

WAN S K, HEE H J, HEE H B, KIM W S, HAN J H, HONG B H