国家/地区 台湾（16）
IPC部 C（16）
IPC大类 H01（16） C01（12） C23（11）
B82（6） B01（3） C08（3）
H05（3） C09（2） D01（2）
IPC小类 H01J（16）
IPC H01J037/32（11） C23C016/26（9） B82Y030/00（5）
C01B031/02（5） C01B031/04（5） H01L021/02（5）
H01L021/285（5） H01L021/768（5） B82Y040/00（4）
C01B032/186（4） C01B032/184（3） C23C016/02（3）
C23C016/04（3） C23C016/455（3） C23C016/50（3）
发明人 NARKEVICIUTE I（2） VARADARAJAN B N（2）
公开年 2021（7） 2022（4）
申请年 2021（6）  2020（3） 
专利权人 APPLIED MATE.（3） LAM RES CORP（2） UNIV TAIWAN .（2）

Upper electrode assembly used in plasma processing apparatus, has heat transfer sheet that is mounted between electrode plate and metal plate and having vertically oriented portion with vertically oriented graphene structures.

TSUJIMOTO H, KOBUNE T, LI L, LEE L, KOBUNEDAKAKI

Producing photoluminescence material involves placing plastic piece into working solution which is water, applying micro-plasma onto surface of the working solution, and degrading the plastic piece into multiple smaller molecular and graphene quantum dot.

CHIANG W, WENG R, WENG R J

Depositing graphene layer on substrate in plasma enhanced chemical vapor deposition of graphene at low temperatures, involves providing substrate within modular microwave plasma chamber, and flowing carbon source and hydrogen source into modular microwave plasma chamber.

KRAUS P A, NGUYEN H, MEBARKI B, WANG C, VALENCIA C, CHUA T C

Processing semiconductor by generating plasma of carbon- and hydrogen-containing precursors, forming layer of graphene on substrate, and halting flow of carbon-containing precursor while maintaining plasma with hydrogen-containing precursor.

INGLE N K, MALLICK A B, SINGHA R S, WANG J, ROY S S

Selective deposition on dielectric layer comprises providing semiconductor substrate, selectively depositing graphene on exposed metal surface of metal layer of substrate, and selective depositing dielectrically-deposited material on layer.

NARKEVICIUTE I, VARADARAJAN B N, SHARMA K, NARKEBICHUDDER I

Aqueous carbon material dispersion liquid for forming film, comprises carbon material, water and dispersing agent containing polymer having structural unit derived from alkylene group-containing monomer and other copolymerizable monomer.

SHIMANAKA H, KAMABAYASHI J, MURAKAMI Y, DOI S, SATO S, HIROYUKI S, JUN K, YOSHIKAZU M, SEIJI D, YUZURU S, MURAKAMI K, SATO Y

Forming layer, comprises e.g. exposing substrate to aromatic precursor in processing chamber, rinsing aromatic precursor from processing chamber, and heating substrate deposit graphene hard mask layer on substrate.

BHUYAN B J, LEONCINI A

Using deposition system involves loading wafer into processing chamber equipped with RF system, supplying aromatic hydrocarbon precursor into processing chamber, turning on RF power of RF system to decompose aromatic hydrocarbon precursor into active radicals.

WU C, NI I, HSU Y, HUANG J, XU Y, WU Z

Depositing graphene on a metal surface of substrate by providing substrate including metal surface in reaction chamber, flowing hydrocarbon precursors into reaction chamber and toward the substrate, and generating radicals of hydrogen.

VARADARAJAN B N, NARKEVICIUTE I

Reactor system for producing carbon-containing powder, has microwave energy source, control circuit having output to generate control signal to adjust pulse frequency of microwave energy, voltage generator, and field-enhancing waveguide.

STOWELL M W, PHAM T V, ANZELMO B H, RISO T, RIESLE T, FAN D