国家/地区 世界知识产权组织（16）
IPC部 C（16）
IPC大类 C23（16）
IPC小类 C23C（15） C01B（7） H01L（7）
B82Y（2） H01G（2） H01J（2）
H01M（2）
IPC C23C016/26（8） C23C016/02（6） H01L021/02（6）
C23C014/06（3） C23C016/505（3） H01L021/768（3）
B82Y040/00（2） C01B032/15（2） C01B032/182（2）
C01B032/184（2） C01B032/186（2） C23C016/455（2）
C23C016/50（2） C23C016/56（2） H01G011/32（2）
发明人 NAVEH D Y（2） SHARMA K（2） VARADARAJAN B N（2）
公开年 2023（16）
申请年 2022（11）  2021（5） 
专利权人 2D GENERATIO.（2） APPLIED MATE.（2） LAM RES CORP（2） UNIV BARILAN（2）

Plasma deposition of material onto two dimensional layer of first substrate, involves depositing protective layer directly onto dimensional layer by pulsed plasma deposition process, and depositing second layer onto protective layer by second plasma deposition process.

RIAZIMEHR S, KNOOPS H, SUNDARAM R

High temperature furnace tube for use in semiconductor process, has supporting plate distributed with multiple layers for supporting multiple substrates, where each substrate is placed on each layer of supporting plate.

WANG H, ZHANG S, SHEN H, LV C, ZHOU D, KIM J, PARK J S, WANG J, JIA S, ZHANG X, KIM Y

Wrinkle flattening unit for flattening wrinkles present in graphene composite structure, has rotation portion that comprises outer rotation unit having multiple suction holes communicating with branch passage and supporting one surface of composite structure.

CHO S M, CHO M G, OH H G, CHO M, OHHONGGI

Corrosion protection unit for electrolytic protection of reinforced structural structure, has modular anode unit (MAU) that includes low carbon alkali-activated geo-polymer cementitious materials (AACM) mortar structure with conductive properties.

DAVIS S, JONES G

Material layer for, e.g. aero-engine applications, comprises porous synthesized carbon-containing composite materials, bonding layer, and hydraulically smooth surface interfacial layer comprising synthesized carbon-containing composite material(s).

STOWELL M, LANNING B

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Depositing nano-graphene comprises flowing hydrocarbon precursors into reaction chamber to adsorb onto metal layer of substrate at specific temperature, where metal layer interacts with adsorbed hydrocarbon precursor.

SHARMA K, VARADARAJAN B N

Coating metal surface with graphene used in organic LED by depositing first graphene molecular precursor on top of metal surface and transforming deposited first graphene molecular precursor into surface bound graphene interfacial layer.

NAVEH D Y

Method for processing semiconductor, involves material layer formed on portion of liner and metal-containing layer, where layer of material comprises graphene and portion of material layer on liner is removed.

MALLICK A B, SINGHA R S, GHOSH S, ROY S S

Growing graphene layer structure on substrate used in opto-electronic device, e.g., solar cell, solar cell, light-emitting diode, organic light-emitting diode, electro-optic modulator, photodetector or diode, involves providing substrate on susceptor in chemical vapor deposition reaction chamber.

THOMAS S, GUINEY I, DIXON S