国家/地区 美国（5） 世界知识产权组织（5） 欧洲专利局（EPO）（4） 韩国（4） 中国（3）
IPC部 C（10）
IPC大类 C01（10）
IPC小类 C01B（10）
IPC C23C016/02（10）
发明人 KIM H K（2）
公开年 2017（5） 2018（4）
申请年 2017（10）
专利权人 KOREA ELECTR.（2）

Formation of graphene layer on metal layer used in sensing applications, involves heating process chamber, introducing carbon including deposition gas into chamber and transporting precursors into metal layer.

GILLES OLLIVIER BORME J, LUIS MACHADO J, PEDRO DOS SANTOS HALL DE AGORR, BARBOSA QUEIROS R, JORGE PEIXEIRO DE FREITAS P

Method for manufacturing graphene, involves forming graphene layer on graphene growth substrate, and forming pattern for formation of graphene on graphene growth substrate.

KIM H K, KIM H

In situ preparation of electroless graphene thin film useful in flexible electronic device, comprises e.g. forming titanium catalyst layer by sputtering on substrate, and performing In-situ plasma assisted chemical vapor deposition.

YOON S G, PARK B J

Production of graphene used as wiring material, involves supplying carbon-containing gas and metal catalyst into chamber and reactivating catalyst by supplying process gas and carbon-containing gas to regrow graphene on catalyst surface.

IFUKU R, MATSUMOTO T

Production method for producing graphene on copper substrate, involves continuously monitoring temperature of copper sheets and heating copper sheets to specified temperature for predetermined time using electromagnetic induction heater.

HABERLE TAPIA P, ORELLANA GOMEZ C, HABERLE T P, ORELLANA G C, HAEBERLE TAPIA P, HAEBERLE T P

Graphene composite electrode used for manufacturing electrochromic device, consists of graphene layer, atomic layer formed on graphene layer, and transparent conductive layer formed on atomic layer.

KIM H K, KIM Y K, HAN S H, LEE S J, SEO J W

Apparatus for continuous production of graphene, has rotatable substrate which is included with endless rotatable surface comprising material for accepting deposition of primary carbon layer prior to graphene growth.

ANDREASSEN JAKOBSEN M, DATSYUK V, JAKOBSEN M A

Chemical vapor deposition process for forming foam-like structure, involves causing decomposition of organometallic compound vapor into metal particles, and precursor gasses into graphene domains and/or hexagonal-boron nitride domains.

LOEBLEIN M, TSANG S H, TEO H T E, TSANG S, ZHANG H

Graphene deposition process for deposition of graphene on substrates, involves generating radio frequency plasma at location proximate to substrate, while flowing precursor gas containing carbon through plasma and over substrate.

CHEN Z, CHUGH S, MEHTA R

Producing graphene film, comprises e.g. ultrasonically cleaning a metal substrate with hydrochloric acid, acetone, and deionized water to remove moisture content on surface, subjecting to high temperature annealing, and uniformly cooling.

HU B, ZHAO W